PLASMA INDUCED FUMING FURNACE
    1.
    发明申请

    公开(公告)号:US20220389536A1

    公开(公告)日:2022-12-08

    申请号:US17773674

    申请日:2020-11-20

    申请人: AURUBIS BEERSE

    摘要: Disclosed is a single-chamber furnace for fuming an evaporable metal or metal compound from a metallurgical charge including a bath furnace for containing a molten charge up to a determined level, the furnace being equipped with a non-transferred plasma torch for the generation of plasma and a first submerged injector for injecting the plasma below the determined level, the furnace further including an afterburning zone to form an oxidized form of the at least one evaporable metal or metal compound, and a recovery zone for recovering the oxidized form from the gas formed in the afterburning zone, whereby the furnace is further equipped with a second submerged injector for injecting extra gas into the furnace below the determined level. Further disclosed is the use of the furnace and a process for fuming an evaporable metal or metal compound from a metallurgical charge.