公开(公告)号：US11250559B2

公开(公告)日：2022-02-15

申请号：US16895412

申请日：2020-06-08

Applicant: ASML Netherlands B.V.

Inventor： Wei Fang ,  Zhao-Li Zhang ,  Jack Jau

IPC: G06K9/00 ,  G06T7/00 ,  G06K9/46

Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.

公开(公告)号：US11880971B2

公开(公告)日：2024-01-23

申请号：US17671522

申请日：2022-02-14

Applicant: ASML Netherlands B.V.

Inventor： Wei Fang ,  Zhao-Li Zhang ,  Jack Jau

IPC: G06K9/00 ,  G06T7/00 ,  G06V10/44 ,  G06V10/50 ,  G06V10/46

CPC classification number: G06T7/001 ,  G06T7/0004 ,  G06V10/44 ,  G06V10/50 ,  G06T2207/10004 ,  G06T2207/10061 ,  G06T2207/30148 ,  G06V10/467 ,  G06V2201/06

Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.

公开(公告)号：US10679340B2

公开(公告)日：2020-06-09

申请号：US16160958

申请日：2018-10-15

Applicant: ASML Netherlands B.V.

Inventor： Wei Fang ,  Zhao-Li Zhang ,  Jack Jau

IPC: G06K9/00 ,  G06T7/00 ,  G06K9/46

Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.