公开(公告)号：US20240160110A1

公开(公告)日：2024-05-16

申请号：US18420091

申请日：2024-01-23

Applicant: ASML Netherlands B.V.

Inventor： Jasper WINTERS ,  Erwin John VAN ZWET ,  Marcus Johannes VAN DER LANS ,  Pieter Willem Herman DE JAGER ,  Geerten Frans Ijsbrand KRAMER

IPC: G03F7/00

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

Abstract: A method for improved sequencing of light delivery in a lithographic process includes determining a sequence of intensities of light to be delivered that includes an interval within the sequence of intensities where substantially no light is delivered to the substrate and delivering light to a substrate by a light source utilizing a digital mirror device (DMD) according to the sequence of intensities.