公开(公告)号：US20220066334A1

公开(公告)日：2022-03-03

申请号：US17415711

申请日：2019-12-12

Applicant: ASML Holding N.V.

Inventor： Zahrasadat DASTOURI ,  Greger Göte ANDERSSON ,  Krishanu SHOME ,  Igor Matheus Petronella AARTS

IPC: G03F9/00

Abstract: A method of applying a measurement correction includes determining an orthogonal subspace used to characterize the measurement as a plot of data. A first axis of the orthogonal subspace corresponds to constructive interference output from an interferometer of the metrology system plus a first error variable and a second axis of the orthogonal subspace corresponds to destructive interference output from the interferometer of the metrology system plus a second error variable. The method also includes determining a slope of the plot of data and determining a fitted line to the plot of data in the orthogonal subspace based on the slope.