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公开(公告)号：US11480885B2
公开(公告)日：2022-10-25
申请号：US17291302
申请日：2019-10-22
Applicant: ASML Holding N.V.
Inventor： James Hamilton Walsh , Richard John Johnson , Christopher Rossi Vann
IPC: G03F7/20
Abstract: An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.
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