公开(公告)号：US20140233003A1

公开(公告)日：2014-08-21

申请号：US14266534

申请日：2014-04-30

Applicant: ASML HOLDING N.V.

Inventor： Herman VOGEL ,  Klaus SIMON ,  Antonius Theodorus Anna Maria DERKSEN

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/70358 ,  G03F7/709 ,  H01L21/027

Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.