公开(公告)号：US20150004312A1

公开(公告)日：2015-01-01

申请号：US14237158

申请日：2011-08-09

Applicant: APPLIED MATERIALS, INC.

Inventor： Evelyn Scheer ,  Markus Hanika ,  Ralph Lindenberg ,  Marcus Bender ,  Andreas Lopp ,  Konrad Schwanitz ,  Fabio Pieralisi ,  Jian Liu

IPC: C23C14/04 ,  C23C16/04

CPC classification number: C23C14/042 ,  C23C16/042

Abstract: An deposition apparatus for forming a deposition material layer on a substrate is described. The deposition apparatus includes a substrate support adapted for holding a substrate; and an edge (660) exclusion mask (640) for covering a periphery of the substrate (610) during layer deposition. The mask has at least one frame portion defining an aperture. The at least one frame portion of the mask is adapted for being moved (670,680) with respect to the substrate depending on the amount of deposition material deposited on the at least one frame portion of the mask. Further, a method for depositing a deposition material layer on a substrate using an edge exclusion mask is described.

Abstract translation: 描述了用于在基板上形成沉积材料层的沉积装置。 沉积设备包括适于保持衬底的衬底支撑件; 以及用于在层沉积期间覆盖衬底（610）的周边的边缘（660）排除掩模（640）。 掩模具有限定孔的至少一个框架部分。 掩模的至少一个框架部分适于相对于基板移动（670,680），这取决于沉积在掩模的至少一个框架部分上的沉积材料的量。 此外，描述了使用边缘排除掩模在基板上沉积沉积材料层的方法。