公开(公告)号：US11047039B2

公开(公告)日：2021-06-29

申请号：US16232496

申请日：2018-12-26

Applicant: APPLIED MATERIALS, INC.

Inventor： Alexander Lerner ,  Kim Vellore ,  Ami Sade ,  Steven Sansoni ,  Andrew Constant ,  Kevin Moraes ,  Roey Shaviv ,  Niranjan Kumar ,  Jeffrey Brodine ,  Michael Karazim

IPC: C23C14/50 ,  C23C14/04 ,  C23C14/24

Abstract: Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.

公开(公告)号：US11204312B2

公开(公告)日：2021-12-21

申请号：US16818499

申请日：2020-03-13

Applicant: Applied Materials, Inc.

Inventor： Ami Sade ,  Todd Egan ,  Shay Assaf ,  Jacob Newman

IPC: G01N21/01 ,  G01B11/06 ,  G01N21/21 ,  G01N21/55

Abstract: Full wafer in-situ metrology chambers and methods of use are described. The metrology chambers include a substrate support and a sensor bar that are rotatable relative to each other. The sensor bar includes a plurality of sensors at different radii from a central axis.

公开(公告)号：US20210285865A1

公开(公告)日：2021-09-16

申请号：US16818499

申请日：2020-03-13

Applicant: Applied Materials, Inc.

Inventor： Ami Sade ,  Todd Egan ,  Shay Assaf ,  Jacob Newman

IPC: G01N21/01 ,  G01B11/06 ,  G01N21/21 ,  G01N21/55

Abstract: Full wafer in-situ metrology chambers and methods of use are described. The metrology chambers include a substrate support and a sensor bar that are rotatable relative to each other. The sensor bar includes a plurality of sensors at different radii from a central axis.