公开(公告)号：US20210293533A1

公开(公告)日：2021-09-23

申请号：US17340108

申请日：2021-06-07

Applicant: APPLE INC.

Inventor： Benny Pesach ,  Zafrir Mor ,  Shimon Yalov ,  Alexander Shpunt

IPC: G01B11/25 ,  G06T7/521 ,  H01S5/42 ,  G02B27/10

Abstract: Optical apparatus includes a beam source, which is configured to generate an optical beam having a pattern imposed thereon. A projection lens is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent. A field multiplier is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.

公开(公告)号：US11852463B2

公开(公告)日：2023-12-26

申请号：US17340108

申请日：2021-06-07

Applicant: APPLE INC.

Inventor： Benny Pesach ,  Zafrir Mor ,  Shimon Yalov ,  Alexander Shpunt

IPC: G01B11/25 ,  G06T7/521 ,  H01S5/00 ,  H01S5/42 ,  G02B27/10

CPC classification number: G01B11/2513 ,  G01B11/25 ,  G02B27/106 ,  G02B27/1086 ,  G06T7/521 ,  H01S5/005 ,  H01S5/423 ,  H01L2224/48091 ,  H01L2224/48091 ,  H01L2924/00014

Abstract: Optical apparatus includes a beam source, which is configured to generate an optical beam having a pattern imposed thereon. A projection lens is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent. A field multiplier is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.