公开(公告)号：US20100147464A1

公开(公告)日：2010-06-17

申请号：US12527503

申请日：2008-02-13

申请人： Tetsuji Shibata ,  Noriyuki Taguchi ,  Yoshiyuki Nakazono

发明人： Tetsuji Shibata ,  Noriyuki Taguchi ,  Yoshiyuki Nakazono

IPC分类号： C23F1/08 ,  C23C16/00 ,  H05H1/24

CPC分类号： H01J37/32366 ,  B08B7/0035 ,  H01J37/32009 ,  H05H1/2406 ,  H05H2001/2418 ,  H05H2001/483

摘要： The present invention relates to a plasma treatment apparatus for treating an object to be treated by activating a plasma production gas by an electric discharge, and by blowing this activated plasma production gas onto the object to be treated. A covered electrode is formed by embedding a conductive layer in an insulating substrate made of a ceramic sintered body. The covered electrodes are arranged opposed to each other to form an electric discharge space in a space between the covered electrodes. A power supply is included for causing an electric discharge in the electric discharge space by applying a voltage to the conductive layers. Since no ceramic material is sprayed, it is possible to reduce the costs of the material for the covered electrodes, and to simplify the process for manufacturing the covered electrodes. The ceramic sintered body has a smaller percentage of voids and is thus denser than a coating film formed by spraying a ceramic material, which is less likely to cause dielectric breakdown during an electric discharge.

摘要翻译： 等离子体处理装置技术领域本发明涉及一种等离子体处理装置，其用于通过放电来激活等离子体产生气体，并将该活化的等离子体产生气体吹送到待处理物体上来对待处理物体进行处理。 覆盖电极通过在由陶瓷烧结体制成的绝缘基板中嵌入导电层而形成。 被覆电极彼此相对布置，以在被覆电极之间的空间中形成放电空间。 包括用于通过向导电层施加电压而在放电空间中放电的电源。 由于没有喷涂陶瓷材料，因此可以降低覆盖电极的材料的成本，并且简化用于制造被覆电极的工艺。 陶瓷烧结体具有较小的空隙百分比，因此比通过喷涂形成的涂膜更致密，陶瓷材料在放电期间不太可能引起电介质击穿。

公开(公告)号：US06670766B2

公开(公告)日：2003-12-30

申请号：US09863474

申请日：2001-05-24

申请人： Keiichi Yamazaki ,  Yukiko Inooka ,  Yasushi Sawada ,  Noriyuki Taguchi ,  Yoshiyuki Nakazono ,  Akio Nakano

发明人： Keiichi Yamazaki ,  Yukiko Inooka ,  Yasushi Sawada ,  Noriyuki Taguchi ,  Yoshiyuki Nakazono ,  Akio Nakano

IPC分类号： H01J724

CPC分类号： H01J37/32357

摘要： A plasma treatment apparatus and a plasma treatment method having the capability of uniformly treating an object with plasma at a high treatment speed. This apparatus includes a tubular vessel having a laterally elongated cross section, a pair of electrodes arranged such that electric flux lines develop substantially in an axial direction of the tubular vessel when one of an AC voltage and a pulse voltage is applied between the electrodes, a gas supply for supplying a streamer generation gas into the tubular vessel, a power source for applying the voltage between the electrodes to generate plural streamers of the gas in the tubular vessel, and a plasma uniformity mechanism for making the plural streamers uniform in a lateral direction of the laterally elongated cross section of the tubular vessel to provide the plasma from one end of the tubular vessel.

摘要翻译： 一种等离子体处理装置和等离子体处理方法，其具有以高处理速度等离子体均匀地处理物体的能力。 该装置包括具有横向细长横截面的管状容器，一对电极被布置为使得当在电极之间施加AC电压和脉冲电压之一时，电流线基本上沿管状容器的轴向方向显影，a 用于向管状容器供应流光产生气体的气体供给源，用于在电极之间施加电压的电源，以在管状容器中产生多个气流拖缆;以及等离子体均匀性机构，用于使多个拖缆在横向方向上均匀 的管状容器的横向细长的横截面以从管状容器的一端提供等离子体。

公开(公告)号：US06465964B1

公开(公告)日：2002-10-15

申请号：US09694324

申请日：2000-10-24

申请人： Noriyuki Taguchi ,  Yasushi Sawada ,  Keiichi Yamazaki ,  Yoshiyuki Nakazono ,  Yukiko Inooka ,  Kazuya Kitayama

发明人： Noriyuki Taguchi ,  Yasushi Sawada ,  Keiichi Yamazaki ,  Yoshiyuki Nakazono ,  Yukiko Inooka ,  Kazuya Kitayama

IPC分类号： H01J724

CPC分类号： H05H1/2406 ,  H05H2001/2456

摘要： A plasma treatment apparatus can generate atmospheric pressure plasma with reliability by help of an ignition electrode to facilitate starting the apparatus without using an expensive impedance matching device. The apparatus comprises a plasma-generation chamber having an aperture from which the plasma blows out, a gas supply unit for supplying a gas for plasma generation into the chamber, a pair of electrodes, a power source for applying an AC electric field between the electrodes to maintain the plasma in the chamber, a pulse generator for providing a pulse voltage, and the ignition electrode for applying the pulse voltage to the gas supplied in the chamber to generate the plasma.

摘要翻译： 等离子体处理装置可以通过点火电极的可靠性产生大气压等离子体，以便于在不使用昂贵的阻抗匹配装置的情况下启动装置。 该装置包括具有等离子体吹出的孔的等离子体生成室，用于将用于等离子体产生的气体供应到室中的气体供给单元，一对电​​极，用于在电极之间施加AC电场的电源 以维持腔室中的等离子体，用于提供脉冲电压的脉冲发生器和用于将脉冲电压施加到在腔室中供应的气体以产生等离子体的点火电极。