CHEMICAL VAPOR DEPOSITION DEVICE WITH ADHERENCE DISRUPTION FEATURE AND METHODS OF USING THE SAME

    公开(公告)号:US20250051913A1

    公开(公告)日:2025-02-13

    申请号:US18801284

    申请日:2024-08-12

    Abstract: Embodiments disclosed herein relate to a modified reactor system for creating coated particles of thermostable agents having reduced loss and improved coating uniformity due to avoidance of adherence of the particles to the reactor or to other particles. In certain embodiments, a reactor system includes a reactor vessel configured to receive particles of thermostable agents, and one or more agitating appendages or devices, including at least one of ultrasonic agitator, mechanical impactor, and low-frequency vibrator either directly connected or in fluid communication with the reactor system for sonicating, impacting, or vibrating a reactor vessel during the particle coating process. In some embodiments, the reactor system includes a gas phase dosing system configured to introduce alternating pulses of chemically gas phase materials into the reactor vessel to form a coating on the particles while continuously or intermittently agitating the reactor system.

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