公开(公告)号：US20240326021A1

公开(公告)日：2024-10-03

申请号：US18522299

申请日：2023-11-29

申请人： Toplus Energy Corporation

发明人： Ming-Yu YEN ,  Ya-Ting TSAI ,  Fu-Yang SHIH ,  Hsu-Lin CHANG

IPC分类号： B01J23/42 ,  B01J21/18 ,  B01J35/30 ,  B01J35/45 ,  B01J35/51 ,  B01J35/54 ,  B01J37/00 ,  B01J37/02 ,  C01B5/00

CPC分类号： B01J23/42 ,  B01J21/18 ,  B01J35/394 ,  B01J35/45 ,  B01J35/51 ,  B01J35/54 ,  B01J37/0009 ,  B01J37/0215 ,  C01B5/00

摘要： The present invention provides a catalyst structure for oxidizing hydrogen in the air, comprising: a base and a catalyst layer, wherein the base comprises a first surface, the catalyst layer is disposed on the first surface of the base, and the catalyst layer comprises: a carbon carrier, multiple catalyst particles, and a fluorinated polymer; wherein the multiple catalyst particles are disposed on a surface of the carbon carrier, and the carbon carrier adheres to the first surface through the fluorinated polymer. The present invention further provides a device for oxidizing hydrogen, comprising: the catalyst structure and a shell, and the shell comprises an accommodation space, a first air flow part and a second air flow part in gas communication with each other; wherein the catalyst structure is disposed in the accommodation space and is between the first air flow part and the second air flow part.

公开(公告)号：US20230364552A1

公开(公告)日：2023-11-16

申请号：US17895013

申请日：2022-08-24

申请人： TOPLUS ENERGY CORPORATION

发明人： Ming-Yu Yen ,  HSU-LIN CHANG ,  FU-YANG SHIH

IPC分类号： B01D53/26 ,  B01D53/86

CPC分类号： B01D53/261 ,  B01D53/86 ,  B01D2257/108 ,  B01D2258/06 ,  B01D2255/9022

摘要： The invention provides a low-temperature hydrogen oxidation system comprising at least one hydrogen oxidation device, at least one hydrogen reaction module is disposed in the hydrogen oxidation device, at least one hydrogen reaction channel is formed in the hydrogen reaction module and is provided with at least one catalyst, the hydrogen oxidation device is provided with at least one gas inlet channel and at least one gas outlet channel to communicate with the hydrogen reaction channel, at least one cooling channel is further formed in the hydrogen oxidation device; and at least one gas humidifying device disposed at a position of the gas inlet channel.