Polishing pad
    1.
    发明授权
    Polishing pad 有权
    抛光垫

    公开(公告)号:US08303372B2

    公开(公告)日:2012-11-06

    申请号:US12439135

    申请日:2007-08-22

    Abstract: A polishing pad having excellent planarization performance and wear resistance includes a polishing layer including a polyurethane foam having fine cells. The polyurethane foam is a cured product of a reaction of (1) an isocyanate-terminated prepolymer (A) that is capable of reacting with 4,4′-methylenebis(o-chloroaniline) to form a non-foamed polyurethane having a tan δ peak temperature of 100° C. or more, (2) an isocyanate-terminated prepolymer (B) that is capable of reacting with 4,4′-methylenebis(o-chloroaniline) to form a non-foamed polyurethane having a tan δ peak temperature of 40° C. or less, and (3) 4,4′-methylenebis(o-chloroaniline), and the isocyanate-terminated prepolymers (A) and (B) are mixed in an (A)/(B) ratio of 50/50 to 90/10 (by wt%). The pad so made is used in the manufacture of semiconductor devices.

    Abstract translation: 具有优异的平坦化性能和耐磨性的抛光垫包括包括具有细孔的聚氨酯泡沫的抛光层。 聚氨酯泡沫体是(1)异氰酸酯封端的预聚物(A)与4,4'-亚甲基双(邻氯苯胺)反应形成具有tanδ的非发泡聚氨酯的反应的固化产物 峰温度为100℃以上,(2)能与4,4'-亚甲基双(邻氯苯胺)反应形成具有tanδ峰的非发泡聚氨酯的异氰酸酯封端的预聚物(B) 温度为40℃以下,(3)4,4'-亚甲基双(邻氯苯胺)和异氰酸酯封端的预聚物(A)和(B)以(A)/(B)比 为50/50至90/10(重量%)。 如此制成的焊盘用于制造半导体器件。

    POLISHING PAD
    5.
    发明申请
    POLISHING PAD 有权
    抛光垫

    公开(公告)号:US20090253353A1

    公开(公告)日:2009-10-08

    申请号:US11720964

    申请日:2005-12-08

    CPC classification number: B24B37/205 Y10T428/24339 Y10T428/24992

    Abstract: It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).

    Abstract translation: 本发明的目的是提供一种抛光垫,其能够在抛光过程中对端点进行高精度光学检测,并且即使在抛光垫之后也可防止在使用期间抛光区域和透光区域之间的浆料泄漏 已被使用了很长时间。 本发明的第二个目的是提供一种能够抑制抛光特性(例如面内均匀性)劣化的抛光垫以及由于抛光区域和透光区域的行为差异而产生的划痕 抛光。 本发明的第三个目的是提供一种具有抛光区域和特定金属浓度等于或低于特定值(阈值)的透光区域的抛光垫。

    Infrared absorption filter
    8.
    发明授权
    Infrared absorption filter 失效
    红外吸收滤光片

    公开(公告)号:US06542292B2

    公开(公告)日:2003-04-01

    申请号:US09740519

    申请日:2000-12-19

    CPC classification number: G02B5/223 G02B5/208

    Abstract: An infrared absorption filter which has absorption in the near-infrared region, manifests high light transmission in the visible region, and does not have large absorption of specific wavelength in the visible region, further, is excellent in environmental stability and durability and has little optical defect, the filter comprising an infrared absorption layer laminated at least on one surface of a transparent polymer film, wherein said transparent polymer film is a film comprising a polymer easy adhesion layer laminated at least on one surface, said transparent polymer film contains substantially no particle, and said transparent polymer film contains foreign materials having a size of 20 &mgr;m or more in an amount of 10/m2 or less per unit area of the film.

    Abstract translation: 在近红外区域具有吸收性的红外线吸收滤光器,在可见光区域具有高透光性,在可见光区域不具有特定波长的吸收性,而且环境稳定性和耐久性优异,光学性差 所述过滤器包括层叠在透明聚合物膜的至少一个表面上的红外吸收层,其中所述透明聚合物膜是包含至少在一个表面上层压的聚合物易粘合层的膜,所述透明聚合物膜基本上不含有颗粒 并且所述透明聚合物膜含有每单位面积膜厚度为10 / m 2以下的尺寸为20μm以上的异物。

    Infrared absorption filter
    9.
    发明授权
    Infrared absorption filter 有权
    红外吸收滤光片

    公开(公告)号:US06522463B1

    公开(公告)日:2003-02-18

    申请号:US09700299

    申请日:2000-11-13

    CPC classification number: G02B5/208

    Abstract: The infrared absorption filter of the present invention has a transmittance of not higher than 30% in the near-infrared region in the wavelength range of 800 to 1100 nm; a difference of 10% or less between a maximum value and a minimum value of transmittance in the visible light region in the wavelength range of 450 to 650 nm; and a transmittance of not lower than 50% at a wavelength of 550 nm, the filter being so excellent in environmental stability that after being left to stand in the air atmosphere at a temperature of 60° C. and a humidity of 95% for 1000 hours, the filter can maintain said spectral property in said range. Consequently, when used for a plasma display or the like, the filter can absorb the unwanted infrared rays radiated from the display, resulting in preventing erroneous operation of a remote control using infrared radiation even in such a high-temperature and high-humidity environment. The filter is gray in color so that when placed in front of a display, the color originated in the display can be seen without discoloration.

    Abstract translation: 本发明的红外线吸收滤光片在800〜1100nm的波长区域的近红外区域的透射率为30%以下; 在450〜650nm的波长范围内的可见光区域的透射率的最大值和最小值之间的差为10%以下; 并且在波长550nm下的透射率不低于50%,该过滤器的环境稳定性非常优异,在空气气氛中在60℃的温度和95%的湿度下放置1000 小时,过滤器可以将所述光谱特性保持在所述范围内。 因此,当用于等离子体显示器等时,滤光器可以吸收从显示器辐射的不想要的红外线,从而即使在这样的高温高湿环境下也能防止使用红外辐射的遥控器的错误操作。 过滤器的颜色为灰色,因此当放置在显示器的前面时,可以看到来自显示屏的颜色没有变色。

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