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公开(公告)号:US08303372B2
公开(公告)日:2012-11-06
申请号:US12439135
申请日:2007-08-22
Applicant: Atsushi Kazuno , Tetsuo Shimomura , Yoshiyuki Nakai , Kazuyuki Ogawa , Tsuyoshi Kimura
Inventor: Atsushi Kazuno , Tetsuo Shimomura , Yoshiyuki Nakai , Kazuyuki Ogawa , Tsuyoshi Kimura
IPC: B24B1/00
CPC classification number: B24B37/24 , B24D3/26 , C08G18/12 , C08G18/4238 , C08G18/4854 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G18/7621 , C08J9/30 , C08J2375/04 , C08L83/00 , C08G18/3243
Abstract: A polishing pad having excellent planarization performance and wear resistance includes a polishing layer including a polyurethane foam having fine cells. The polyurethane foam is a cured product of a reaction of (1) an isocyanate-terminated prepolymer (A) that is capable of reacting with 4,4′-methylenebis(o-chloroaniline) to form a non-foamed polyurethane having a tan δ peak temperature of 100° C. or more, (2) an isocyanate-terminated prepolymer (B) that is capable of reacting with 4,4′-methylenebis(o-chloroaniline) to form a non-foamed polyurethane having a tan δ peak temperature of 40° C. or less, and (3) 4,4′-methylenebis(o-chloroaniline), and the isocyanate-terminated prepolymers (A) and (B) are mixed in an (A)/(B) ratio of 50/50 to 90/10 (by wt%). The pad so made is used in the manufacture of semiconductor devices.
Abstract translation: 具有优异的平坦化性能和耐磨性的抛光垫包括包括具有细孔的聚氨酯泡沫的抛光层。 聚氨酯泡沫体是(1)异氰酸酯封端的预聚物(A)与4,4'-亚甲基双(邻氯苯胺)反应形成具有tanδ的非发泡聚氨酯的反应的固化产物 峰温度为100℃以上,(2)能与4,4'-亚甲基双(邻氯苯胺)反应形成具有tanδ峰的非发泡聚氨酯的异氰酸酯封端的预聚物(B) 温度为40℃以下,(3)4,4'-亚甲基双(邻氯苯胺)和异氰酸酯封端的预聚物(A)和(B)以(A)/(B)比 为50/50至90/10(重量%)。 如此制成的焊盘用于制造半导体器件。
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公开(公告)号:US07762870B2
公开(公告)日:2010-07-27
申请号:US11366981
申请日:2006-03-02
Applicant: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
Inventor: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
CPC classification number: B24B37/26 , B24B37/22 , B24D3/28 , B24D11/001 , B24D11/008
Abstract: A polishing pad includes a polishing layer having abrasive grains dispersed in a resin and is characterized in that the resin is a resin containing ionic groups in the range of 20 to 1500 eq/ton.
Abstract translation: 抛光垫包括具有分散在树脂中的磨粒的抛光层,其特征在于该树脂是含有20至1500eq / ton范围内的离子基团的树脂。
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公开(公告)号:US07651761B2
公开(公告)日:2010-01-26
申请号:US10494249
申请日:2002-10-03
Applicant: Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura , Hiroshi Seyanagi
Inventor: Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura , Hiroshi Seyanagi
CPC classification number: C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
Abstract: The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
Abstract translation: 本发明提供了抛光垫,通过该抛光垫,诸如透镜,反射镜等的光学材料或需要高度表面平坦度的材料,如在硅树脂晶片,玻璃基板或用于硬盘的铝基板的抛光中,或通常的金属抛光 ,可平坦化,抛光效率高。 本发明还提供一种平面化特性优异的半导体晶片用抛光垫,无磨损,可以低成本地制造。 提供了没有脱扣误差的抛光垫,从而不会损坏晶片,也不会降低工作效率。 提供了平面性良好,晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。 提供了可以使平面性改善和划痕减少兼容的抛光垫。
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公开(公告)号:US07641540B2
公开(公告)日:2010-01-05
申请号:US11366077
申请日:2006-03-02
Applicant: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
Inventor: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
IPC: B24D11/00
CPC classification number: B24B37/26 , B24B37/22 , B24D3/28 , B24D11/001 , B24D11/008
Abstract: A polishing pad includes at least a polishing layer and a cushion layer and is characterized in that the difference in hardness in Shore D hardness between the polishing layer and the cushion layer is 3 or more.
Abstract translation: 抛光垫至少包括抛光层和缓冲层,其特征在于,抛光层和缓冲层之间的肖氏D硬度的硬度差为3以上。
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公开(公告)号:US20090253353A1
公开(公告)日:2009-10-08
申请号:US11720964
申请日:2005-12-08
Applicant: Kazuyuki Ogawa , Tetsuo Shimomura , Atsushi Kazuno , Yoshiyuki Nakai , Masahiro Watanabe , Takatoshi Yamada , Masahiko Nakamori
Inventor: Kazuyuki Ogawa , Tetsuo Shimomura , Atsushi Kazuno , Yoshiyuki Nakai , Masahiro Watanabe , Takatoshi Yamada , Masahiko Nakamori
CPC classification number: B24B37/205 , Y10T428/24339 , Y10T428/24992
Abstract: It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).
Abstract translation: 本发明的目的是提供一种抛光垫,其能够在抛光过程中对端点进行高精度光学检测,并且即使在抛光垫之后也可防止在使用期间抛光区域和透光区域之间的浆料泄漏 已被使用了很长时间。 本发明的第二个目的是提供一种能够抑制抛光特性(例如面内均匀性)劣化的抛光垫以及由于抛光区域和透光区域的行为差异而产生的划痕 抛光。 本发明的第三个目的是提供一种具有抛光区域和特定金属浓度等于或低于特定值(阈值)的透光区域的抛光垫。
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公开(公告)号:US20060148391A1
公开(公告)日:2006-07-06
申请号:US11366077
申请日:2006-03-02
Applicant: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
Inventor: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
IPC: B24D11/00
CPC classification number: B24B37/26 , B24B37/22 , B24D3/28 , B24D11/001 , B24D11/008
Abstract: A polishing pad includes at least a polishing layer and a cushion layer and is characterized in that the difference in hardness in Shore D hardness between the polishing layer and the cushion layer is 3 or more.
Abstract translation: 抛光垫至少包括抛光层和缓冲层,其特征在于,抛光层和缓冲层之间的肖氏D硬度的硬度差为3以上。
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公开(公告)号:US20050064709A1
公开(公告)日:2005-03-24
申请号:US10494249
申请日:2002-10-03
Applicant: Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura , Hiroshi Seyanagi
Inventor: Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura , Hiroshi Seyanagi
IPC: B24B37/24 , B24D3/30 , C08G18/00 , C08G18/10 , C08G18/12 , C08G18/66 , C08G18/72 , H01L21/306 , H01L21/302 , H01L21/461
CPC classification number: C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
Abstract: The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
Abstract translation: 本发明提供了抛光垫,通过该抛光垫,诸如透镜,反射镜等的光学材料或需要高度表面平坦度的材料,如在硅树脂晶片,玻璃基板或用于硬盘的铝基板的抛光中,或通常的金属抛光 ,可平坦化,抛光效率高。 本发明还提供一种平面化特性优异的半导体晶片用抛光垫,无磨损,可以低成本地制造。 提供了没有脱扣误差的抛光垫,从而不会损坏晶片,也不会降低工作效率。 提供了平面性良好,晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。 提供了可以使平面性改善和划痕减少兼容的抛光垫。
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公开(公告)号:US06542292B2
公开(公告)日:2003-04-01
申请号:US09740519
申请日:2000-12-19
Applicant: Shinya Onomichi , Tetsuo Shimomura , Seiichiro Yokoyama
Inventor: Shinya Onomichi , Tetsuo Shimomura , Seiichiro Yokoyama
IPC: G02B522
Abstract: An infrared absorption filter which has absorption in the near-infrared region, manifests high light transmission in the visible region, and does not have large absorption of specific wavelength in the visible region, further, is excellent in environmental stability and durability and has little optical defect, the filter comprising an infrared absorption layer laminated at least on one surface of a transparent polymer film, wherein said transparent polymer film is a film comprising a polymer easy adhesion layer laminated at least on one surface, said transparent polymer film contains substantially no particle, and said transparent polymer film contains foreign materials having a size of 20 &mgr;m or more in an amount of 10/m2 or less per unit area of the film.
Abstract translation: 在近红外区域具有吸收性的红外线吸收滤光器,在可见光区域具有高透光性,在可见光区域不具有特定波长的吸收性,而且环境稳定性和耐久性优异,光学性差 所述过滤器包括层叠在透明聚合物膜的至少一个表面上的红外吸收层,其中所述透明聚合物膜是包含至少在一个表面上层压的聚合物易粘合层的膜,所述透明聚合物膜基本上不含有颗粒 并且所述透明聚合物膜含有每单位面积膜厚度为10 / m 2以下的尺寸为20μm以上的异物。
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公开(公告)号:US06522463B1
公开(公告)日:2003-02-18
申请号:US09700299
申请日:2000-11-13
Applicant: Tetsuo Shimomura , Shinya Onomichi , Masanori Kobayashi , Yozo Yamada , Seiichiro Yokoyama
Inventor: Tetsuo Shimomura , Shinya Onomichi , Masanori Kobayashi , Yozo Yamada , Seiichiro Yokoyama
IPC: G02B0000
CPC classification number: G02B5/208
Abstract: The infrared absorption filter of the present invention has a transmittance of not higher than 30% in the near-infrared region in the wavelength range of 800 to 1100 nm; a difference of 10% or less between a maximum value and a minimum value of transmittance in the visible light region in the wavelength range of 450 to 650 nm; and a transmittance of not lower than 50% at a wavelength of 550 nm, the filter being so excellent in environmental stability that after being left to stand in the air atmosphere at a temperature of 60° C. and a humidity of 95% for 1000 hours, the filter can maintain said spectral property in said range. Consequently, when used for a plasma display or the like, the filter can absorb the unwanted infrared rays radiated from the display, resulting in preventing erroneous operation of a remote control using infrared radiation even in such a high-temperature and high-humidity environment. The filter is gray in color so that when placed in front of a display, the color originated in the display can be seen without discoloration.
Abstract translation: 本发明的红外线吸收滤光片在800〜1100nm的波长区域的近红外区域的透射率为30%以下; 在450〜650nm的波长范围内的可见光区域的透射率的最大值和最小值之间的差为10%以下; 并且在波长550nm下的透射率不低于50%,该过滤器的环境稳定性非常优异,在空气气氛中在60℃的温度和95%的湿度下放置1000 小时,过滤器可以将所述光谱特性保持在所述范围内。 因此,当用于等离子体显示器等时,滤光器可以吸收从显示器辐射的不想要的红外线,从而即使在这样的高温高湿环境下也能防止使用红外辐射的遥控器的错误操作。 过滤器的颜色为灰色,因此当放置在显示器的前面时,可以看到来自显示屏的颜色没有变色。
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公开(公告)号:US08148441B2
公开(公告)日:2012-04-03
申请号:US11794284
申请日:2006-02-27
Applicant: Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
Inventor: Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC: C08G18/10
CPC classification number: B24B37/24 , B24D3/28 , C08G18/10 , C08G2101/00 , C08G18/3237 , C08G18/3215
Abstract: A method for manufacturing a polishing pad made from a polyurethane resin foam having very uniform, fine cells therein and a polishing pad obtained by that method provides a polishing pad having better polishing characteristics (especially, in planarization) while providing improved dressability while maintaining the planarization characteristics and polishing speed of a conventional polishing pad. The polyurethane resin foam is a cured product obtained by reacting an isocyanate-terminated prepolymer with an aromatic polyamine chain extender having a melting point of 70° C. or lower, for example.
Abstract translation: 制造由其中具有非常均匀的细小单元的聚氨酯树脂泡沫制成的抛光垫的方法和通过该方法获得的抛光垫提供了一种抛光垫具有更好的抛光特性(特别是平面化)的同时提供改善的可修整性,同时保持平面化 特性和抛光速度。 聚氨酯树脂发泡体是通过将异氰酸酯封端的预聚物与熔点为70℃以下的芳香族多胺扩链剂反应得到的固化物。
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