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公开(公告)号：US4559452A
公开(公告)日：1985-12-17
申请号：US498726
申请日：1983-05-27
Applicant: Seigo Igaki , Tadao Nakakuki , Takefumi Inagaki , Shuetsu Oikawa , Takashi Fujimura
Inventor： Seigo Igaki , Tadao Nakakuki , Takefumi Inagaki , Shuetsu Oikawa , Takashi Fujimura
Abstract: An apparatus for detecting an edge of a semitransparent plane substance provided with a light source array including a plurality of light sources and a photosensor array including a plurality of photosensors. A selection circuit selects a pair of one of the light sources and one of the photosensors, respectively, and a comparator circuit compares the outputs of each of the photosensors in each pair when no detected substance exists between the light source array and the photosensor array, and the corresponding outputs when a substance exists between the light source array and the photosensor array, so that the edge portion of the substance can be detected.
Abstract translation: 一种用于检测具有包括多个光源的光源阵列和包括多个光电传感器的光传感器阵列的半透明平面物质的边缘的装置。 选择电路分别选择一对光源和一个光电传感器，并且当光源阵列和光电传感器阵列之间没有检测到的物质时，比较器电路比较每对光电传感器的输出， 以及当光源阵列和光电传感器阵列之间存在物质时相应的输出，从而可以检测物质的边缘部分。
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公开(公告)号：US4547895A
公开(公告)日：1985-10-15
申请号：US428605
申请日：1982-09-30
Applicant: Kikuo Mita , Masayuki Oyama , Takashi Yoshida , Masato Nakashima , Katsumi Fujihara , Tadao Nakakuki
Inventor： Kikuo Mita , Masayuki Oyama , Takashi Yoshida , Masato Nakashima , Katsumi Fujihara , Tadao Nakakuki
CPC classification number: G01B11/024 , G06K9/54 , G06T7/60
Abstract: A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.
Abstract translation: 一种图案检查系统，用于通过激光束扫描检查形成在诸如光掩模的基座上的图案的图案检查系统，其包括用于检测图案的主体和边缘的装置;存储装置，具有多个存储单元，用于分开存储 图案的检测体和多个边缘，用于测量图案的两个平行边缘之间的图案的主体的宽度的装置，用于检测和校正缺失图案边缘的装置，用于反转图案的装置，装置 用于减少图案，以及用于消除图案内的针孔和污渍的装置。
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公开(公告)号：US4392120A
公开(公告)日：1983-07-05
申请号：US197345
申请日：1980-06-23
Applicant: Kikuo Mita , Masayuki Oyama , Takashi Yoshida , Masato Nakashima , Katsumi Fujihara , Tadao Nakakuki
Inventor： Kikuo Mita , Masayuki Oyama , Takashi Yoshida , Masato Nakashima , Katsumi Fujihara , Tadao Nakakuki
CPC classification number: G06T7/60 , G01B11/024 , G06K9/54 , G06T2207/30108
Abstract: A pattern inspection system, for inspecting a pattern formed on a base, such as a photo-mask, by means of laser beam scanning, which includes a device for detecting the body and edges of the pattern a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern and a device for eliminating pinholes and stains within a pattern.
Abstract translation: PCT No.PCT / JP79 / 00271 Sec。 371日期1980年6月30日第 102（e）1980年6月23日PCT提交1979年10月25日PCT公布。 公开号WO80 / 01002 日期：1980年5月15日。一种图案检查系统，用于通过激光束扫描来检查形成在基底上的图案（例如光掩膜），其包括用于检测图案的主体和边缘的装置，存储装置 具有用于分别存储检测到的主体和图案的多个边缘的多个存储单元，用于测量图案的两个平行边缘之间的图案的主体的宽度的装置，用于检测和校正缺失图案边缘的装置， 用于反转图案的装置，用于减小图案的装置和用于消除图案内的针孔和污渍的装置。
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