公开(公告)号：US06646235B2

公开(公告)日：2003-11-11

申请号：US10037151

申请日：2001-10-19

申请人： Steven Aihua Chen ,  Henry Ho ,  Michael X. Yang ,  Bruce W. Peuse ,  Karl Littau ,  Yu Chang

发明人： Steven Aihua Chen ,  Henry Ho ,  Michael X. Yang ,  Bruce W. Peuse ,  Karl Littau ,  Yu Chang

IPC分类号： H05B368

CPC分类号： H01L21/67103

摘要： A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater. A method of controlling the temperature in a reactor comprising providing a resistive heater in a chamber of a reactor, measuring the temperature with at least two temperature sensors, and controlling the temperature in the reactor by regulating a power supply to the first heating element and the second heating element according to the temperature measured by the first temperature sensor and the second temperature sensor.

公开(公告)号：US6066836A

公开(公告)日：2000-05-23

申请号：US717780

申请日：1996-09-23

申请人： Steven Aihua Chen ,  Henry Ho ,  Mei Chang ,  Ming Xi ,  Chen-An Chen ,  Chiliang Chen

发明人： Steven Aihua Chen ,  Henry Ho ,  Mei Chang ,  Ming Xi ,  Chen-An Chen ,  Chiliang Chen

IPC分类号： C23C16/46 ,  F27D99/00 ,  F27B5/14 ,  C23C16/00

CPC分类号： F27D99/0006 ,  C23C16/46 ,  F27D2099/0008

摘要： A resistive heating structure for a processing apparatus such as a chemical vapor deposition chamber. The system includes a resistive heating substrate holder including a support surface and a support shaft, the holder being comprised of a first material. The support surface includes a resistive heating element. The support shaft has a given length, and through bores for allowing a thermocouple to engage the support surface and electrical conductors to couple to the resistive heating element in the support surface. A metallic mounting structure is coupled to the support shaft and secured to the process apparatus to create a sealed environment within the holder and mounting structure to protect the electrical leads and thermocouple from the process environment.

摘要翻译： 用于诸如化学气相沉积室的处理装置的电阻加热结构。 该系统包括电阻加热衬底保持器，其包括支撑表面和支撑轴，该保持器由第一材料构成。 支撑表面包括电阻加热元件。 支撑轴具有给定的长度，并且通过孔允许热电偶接合支撑表面和电导体以耦合到支撑表面中的电阻加热元件。 金属安装结构联接到支撑轴并固定到处理装置以在保持器和安装结构内形成密封环境，以保护电引线和热电偶免受过程环境的影响。

公开(公告)号：US5837058A

公开(公告)日：1998-11-17

申请号：US680328

申请日：1996-07-12

申请人： Steven Aihua Chen ,  Ming Xi ,  Ruiping Wang

发明人： Steven Aihua Chen ,  Ming Xi ,  Ruiping Wang

IPC分类号： C23C16/44 ,  C23C16/458 ,  H01L21/205 ,  H01L21/683 ,  C23C16/00

CPC分类号： C23C16/4581

摘要： A susceptor with improved resistance to thermal cycling and chemical attack between processing and cleaning cycles. The susceptor comprises a top surface is surrounded by a lip, the lip having a beveled inner side, a top side, an outer side, a first rounded edge between the top side and the outer side, a second rounded edge between the top side and the inner side, and a third rounded edge between the inner side and the top surface. The susceptor comprises a body of graphite covered by a coating of aluminum nitride.

摘要翻译： 具有改善的抗热循环耐受性和在处理和清洁循环之间的化学侵蚀的感受器。 所述感受体包括顶表面，所述顶表面由唇缘包围，所述唇缘具有斜边的内侧，顶侧，外侧，在所述顶侧和外侧之间的第一圆形边缘，在所述顶侧和所述外侧之间的第二圆形边缘， 内侧和内侧和顶表面之间的第三圆形边缘。 感受体包括由氮化铝涂层覆盖的石墨体。

公开(公告)号：US06423949B1

公开(公告)日：2002-07-23

申请号：US09314845

申请日：1999-05-19

申请人： Steven Aihua Chen ,  Henry Ho ,  Michael X. Yang ,  Bruce W. Peuse ,  Karl Littau ,  Yu Chang

发明人： Steven Aihua Chen ,  Henry Ho ,  Michael X. Yang ,  Bruce W. Peuse ,  Karl Littau ,  Yu Chang

IPC分类号： H05B368

CPC分类号： H01L21/67103

摘要： A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater. A method of controlling the temperature in a reactor comprising providing a resistive heater in a chamber of a reactor, measuring the temperature with at least two temperature sensors, and controlling the temperature in the reactor by regulating a power supply to the first heating element and the second heating element according to the temperature measured by the first temperature sensor and the second temperature sensor.