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公开(公告)号：US4704299A
公开(公告)日：1987-11-03
申请号：US795393
申请日：1985-11-06
申请人： Roy F. Wielonski , Peter J. Melling
发明人： Roy F. Wielonski , Peter J. Melling
摘要： A process for curing and densifying a sol-gel derived inorganic thin film at lower temperatures (between 10.degree. C. and 400.degree. C.) by applying the films to a substrate, drying the film at a low temperature, exposing the film to a low pressure plasma. The film may be an oxide (e.g. SiO.sub.2), nitride (e.g. Si.sub.3 N.sub.4), oxynitride (e.g. SiO.sub.x N.sub.y) or sulfide (e.g. GeS.sub.2).
摘要翻译： 一种在较低温度（10℃至400℃）下将溶胶 - 凝胶衍生的无机薄膜固化并致密化的方法，该方法是通过将膜施加到基底上，在低温下干燥该膜，将该膜暴露于 低压等离子体 该膜可以是氧化物（例如SiO 2），氮化物（例如Si 3 N 4），氧氮化物（例如SiO x N y）或硫化物（例如GeS 2）。
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公开(公告)号：US5492771A
公开(公告)日：1996-02-20
申请号：US301681
申请日：1994-09-07
CPC分类号： C23C30/005 , B23K35/327 , B23K35/3006 , B23K35/302 , Y10T428/12014 , Y10T428/12028 , Y10T428/12049 , Y10T428/12056 , Y10T428/12146
摘要： An improved method of making a monolayer abrasive tool using a relatively low melting point, soft filler metal alloy braze which possesses sufficiently high yield strength combined with a relatively high ductility and low elastic modulus to produce an exceptional bond between a monolayer of superabrasive particles and the tool substrate. The steps of the brazing process include applying a layer of the filler metal alloy including a an active metal in either pre-alloyed or as a mixture with the metal alloy and a monolayer of superabrasive crystals over the filler metal layer. This assembly is heated in a mon-oxidizing atmosphere such as a vacuum to melt the alloy and braze bond the superabrasive particles to the tool substrate. The alloy bond formed possess the properties of a ductility of at least 20 percent elongation, an elastic modulus of less than 15.times.10.sup.6 or less, and a yield strength preferably at least about 45,000 to 50,000 psi. A copper/silver based alloy including about 8 to 15 weight percent indium and 1 to 4 weight percent titanium is used in a preferred embodiment of the method disclosed.
摘要翻译： 使用相对较低熔点的软质填料金属合金钎焊制备单层研磨工具的改进方法，其具有足够高的屈服强度以及相对高的延展性和低弹性模量，以在单层超级磨料颗粒与 工具基板。 钎焊工艺的步骤包括将包含活性金属的填料金属合金层施加在与金属合金的预合金化或混合物中，以及在填充金属层上的单层超研磨晶体。 该组件在诸如真空的单氧化气氛中加热以熔化合金并将超磨料颗粒钎焊到工具基底。 形成的合金结合物具有至少20％伸长率，小于15×10 6或更小的弹性模量和优选至少约45,000至50,000psi的屈服强度的延展性。 在所公开的方法的优选实施方案中使用包含约8至15重量％的铟和1至4重量％的钛的铜/银基合金。
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公开(公告)号：US07300338B2
公开(公告)日：2007-11-27
申请号：US11508654
申请日：2006-08-23
IPC分类号： B24B1/00
CPC分类号： B24B53/017 , B24B53/12 , B24D3/14 , B24D18/00
摘要： A method of making and the resulting non-metallic CMP conditioning pad comprising a non-metallic substrate and a single layer of abrasive particles bonded to the substrate by a non-metallic bonding medium. Preferred substrates include aluminum oxide and graphite. A bonding system employing finely powdered aluminum oxide particles mixed with a suitable adhesive is employed to bond the abrasive layer to the aluminum oxide substrate. Silicon carbide particles mixed into a compatible adhesive carrier including a polymer composition is preferred for bonding the abrasive particle layer to a graphite or carbide substrate.
摘要翻译： 一种制造方法和所得到的非金属CMP调理垫包括非金属基底和通过非金属粘合介质结合到基底上的单层磨料颗粒。 优选的基材包括氧化铝和石墨。 采用使用与合适的粘合剂混合的细粉状氧化铝颗粒的粘结系统将磨料层粘合到氧化铝基材上。 混合到包括聚合物组合物的相容粘合剂载体中的碳化硅颗粒优选用于将磨料颗粒层结合到石墨或碳化物基底。
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公开(公告)号：US06517424B2
公开(公告)日：2003-02-11
申请号：US09790461
申请日：2001-02-22
IPC分类号： B24B5300
CPC分类号： B24B53/017 , B24B53/12 , B24D7/02 , B24D18/00
摘要： A conditioning element for trueing and dressing a polishing pad used in a chemical mechanical polishing process (CMP) in connection with the manufacture of semi-conductors is provided with a relatively thin protective coating comprising a material resistant to corrosive attack by CMP slurry compositions, including those particularly well-suited to resist the harsher highly acidic slurry compositions. The CMP conditioning disk comprises a substrate having a surface carrying a monolayer of superabrasive particles braze bonded to the disk and a relatively thin liquid impermeable protective coating which is applied over the surface of the braze bond material and abrasive particles. For use in highly corrosive slurry compositions such as ferric nitrate, CMP braze bonded disk carrying coatings applied by vapor deposition methods comprising chromium and multilayered coatings comprising layers of chromium and amorphous diamond or chromium nitride, for example, are particularly effective to preserve the bond strength of the braze bond material holding the abrasive particles on the CMP conditioning disks.
摘要翻译： 用于在与半导体制造有关的化学机械抛光工艺（CMP）中使用的抛光垫的修整和修整的调节元件设置有相对薄的保护涂层，其包括耐受CMP浆料组合物的腐蚀性侵蚀的材料，包括 那些特别适合于抵抗更苛刻的高酸性浆料组合物的那些。 CMP调节盘包括具有表面的基底，该表面承载着与盘接合的钎焊的超级磨料颗粒单层，以及涂覆在钎焊接合材料和磨料颗粒表面上的相对薄的液体不可渗透的保护涂层。 为了用于高度腐蚀性的浆料组合物如硝酸铁，例如通过包括铬和包含铬层和非晶金刚石或氮化铬的多层涂层的气相沉积方法施加的CMP钎焊粘结盘载体涂层对于保持粘合强度特别有效 将磨料颗粒保持在CMP调节盘上的钎焊接合材料。
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公开(公告)号：US4422915A
公开(公告)日：1983-12-27
申请号：US72509
申请日：1979-09-04
申请人： Roy F. Wielonski , Harry A. Beale
发明人： Roy F. Wielonski , Harry A. Beale
摘要： The invention provides a method of coating a surface 21 of a substrate 20, or of an article, of a material, such as glass, metal, ceramic, cloth or the like, with a colored film-like polymeric coating 22 consisting essentially of a plasma formed polymer matrix 23 containing therein particulates 24. The method comprises introducing plasma-polymerizable material through at least one conduit 30 into the interior region 14 of an appropriate apparatus 10, 35, or 39 in which region 14 there is maintained an electrical discharge conducive to plasma polymerize the introduced material and deposit it on surface 21 concurrently with a depositing therewith of the particulates 24, or color centers, of a size and in a distribution adapted through selective scattering and adsorption of light to provide a desired color while the substrate 20 contacts, or is, a cathode element 19 maintained at an electrical potential conducive for the depositing. Preferably the particulates are opaque and colloidal and provided by thermal evaporation employing a filament resistance heater 29, inductively heated evaporation source means 36, or an electron beam evaporator means 40.
摘要翻译： 本发明提供了一种涂覆基材20的表面21或物品如玻璃，金属，陶瓷，布等的材料的方法，该着色膜状聚合物涂层22基本上由 含有颗粒24的等离子体形成的聚合物基质23.该方法包括将等离子体可聚合材料通过至少一个导管30引入合适的装置10,35或39的内部区域14中，其中区域14保持放电导电 将等离子体聚合引入的材料并将其沉积在表面21上，同时沉积具有适于通过选择性散射和吸附光以提供期望颜色的尺寸和分布的颗粒24或颜色中心以提供期望的颜色，同时衬底20 接触或者是保持在有利于沉积的电位的阴极元件19。 优选地，颗粒是不透明和胶体的，并且通过使用灯丝电阻加热器29，感应加热蒸发源装置36或电子束蒸发器装置40的热蒸发提供。
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6.发明授权Plasma polymerized interfacial coatings for improved adhesion of sputtered bright metal on plastic 失效等离子体聚合的界面涂层，用于改善溅射的亮金属在塑料上的附着力
公开(公告)号：US4374717A
公开(公告)日：1983-02-22
申请号：US318634
申请日：1981-11-05
CPC分类号： C08J7/123 , B05D1/62 , B05D7/24 , C23C14/024 , C23C14/205 , B05D2201/00 , C08J2375/04
摘要： The adhesion of sputtered chromium or chromium metal alloys to urethane substrates is improved by the application of plasma polymerized acetonitrile coating layers directly beneath and over the chromium layer.
摘要翻译： 通过在铬层上直接施加等离子体聚合的乙腈涂层，溅射的铬或铬金属合金对聚氨酯基底的粘附性得到改善。
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