Power column
    1.
    发明授权
    Power column 有权
    电源列

    公开(公告)号:US06364678B1

    公开(公告)日:2002-04-02

    申请号:US09718503

    申请日:2000-11-24

    IPC分类号: H01R460

    CPC分类号: H02G3/0493

    摘要: A power column providing a conduit for power and communications wiring in a building includes a column structure having electrical power outlets and video data modules (VDMs) accessible on opposite flat end faces of the column structure. An isolated electrical raceway within the column structure includes the electrical outlets. The column structure is pre-wired electrically with wiring that extends through the raceway to the top end of the structure. Pre-wiring allows the column to be installed and then connected to an electrical supply after installation.

    摘要翻译: 提供用于建筑物中的电力和通信布线的导管的电源列包括具有电力出口的列结构和在柱结构的相对的平坦端面上可访问的视频数据模块(VDM)。 列结构内的隔离电路包括电源插座。 列结构通过线路预先布线,线路延伸穿过滚道至结构的顶端。 预接线允许安装柱,然后在安装后连接到电源。

    Apparatus for cleaning and drying substrates
    2.
    发明授权
    Apparatus for cleaning and drying substrates 有权
    用于清洁和干燥基材的设备

    公开(公告)号:US07718011B2

    公开(公告)日:2010-05-18

    申请号:US11834657

    申请日:2007-08-06

    IPC分类号: B08B3/04 B08B5/00 B08B7/04

    CPC分类号: H01L21/67028 Y10S134/902

    摘要: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. The invention includes spraying a line of fluid to a substrate, thereby creating an air/fluid interface line on the substrate; supplying a line of drying vapors to the air/fluid interface line, thereby creating a Marangoni drying effect along the air/fluid interface line; and moving the substrate relative to the air/fluid line. Numerous other aspects are provided.

    摘要翻译: 提供了一种用于清洗,漂洗和马兰戈尼干燥基材的方法和设备。 本发明包括将一行流体喷射到基底上,由此在基底上形成空气/流体界面线; 向空气/流体界面管线提供一系列干燥蒸汽,从而沿空气/流体界面线产生马兰戈尼干燥效果; 以及相对于空气/流体界面线移动衬底。 提供了许多其他方面。

    Apparatus for cleaning and drying substrates

    公开(公告)号:US06746544B2

    公开(公告)日:2004-06-08

    申请号:US10046423

    申请日:2001-10-25

    IPC分类号: B08B300

    CPC分类号: H01L21/67028 Y10S134/902

    摘要: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.

    Apparatus for cleaning and drying substrates
    4.
    发明授权
    Apparatus for cleaning and drying substrates 有权
    用于清洁和干燥基材的设备

    公开(公告)号:US07252098B2

    公开(公告)日:2007-08-07

    申请号:US10667855

    申请日:2003-09-22

    IPC分类号: B08B7/04 B08B3/04 B08B3/10

    CPC分类号: H01L21/67028 Y10S134/902

    摘要: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.

    摘要翻译: 提供了一种用于清洗,漂洗和马兰戈尼干燥基材的方法和设备。 沿着形成空气/流体界面线的基底表面喷射流体线,并且将一线干燥蒸气供应到界面线以实现马兰戈尼干燥。 因此,大部分基板被同时干燥。 优选的装置采用清洁和/或冲洗流体箱。 在罐体流体上方,当衬底从清洁流体提升时,漂洗流体源将冲洗流体引导到在衬底表面上形成弯液面的衬底的表面,并且干燥蒸汽源将干燥蒸气引导到弯液面。 干燥蒸汽降低了弯液面的表面张力,引起从基材表面冲洗流体的马兰戈尼流,从而干燥基材。 清洗液槽具有基板接收和清洁部分和基板漂洗部分。 冲洗流体源和干燥蒸气源由在罐的漂洗部分上方的干燥箱包围。 因此,在时间上至少部分重叠地执行基板装载,清洁,漂洗,干燥和卸载。

    Apparatus for cleaning and drying substrates

    公开(公告)号:US20060260653A1

    公开(公告)日:2006-11-23

    申请号:US11497445

    申请日:2006-07-31

    IPC分类号: B08B3/00

    CPC分类号: H01L21/67028 Y10S134/902

    摘要: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.

    APPARATUS FOR CLEANING AND DRYING SUBSTRATES
    6.
    发明申请
    APPARATUS FOR CLEANING AND DRYING SUBSTRATES 有权
    用于清洁和干燥基板的装置

    公开(公告)号:US20070272278A1

    公开(公告)日:2007-11-29

    申请号:US11834657

    申请日:2007-08-06

    IPC分类号: B08B3/04

    CPC分类号: H01L21/67028 Y10S134/902

    摘要: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.

    摘要翻译: 提供了一种用于清洗,漂洗和马兰戈尼干燥基材的方法和设备。 沿着形成空气/流体界面线的基底表面喷射流体线,并且将一线干燥蒸气供应到界面线以实现马兰戈尼干燥。 因此,大部分基板被同时干燥。 优选的装置采用清洁和/或冲洗流体箱。 在罐体流体上方,当衬底从清洁流体提升时,漂洗流体源将冲洗流体引导到在衬底表面上形成弯液面的衬底的表面,并且干燥蒸汽源将干燥蒸气引导到弯液面。 干燥蒸汽降低了弯液面的表面张力,引起从基材表面冲洗流体的马兰戈尼流,从而干燥基材。 清洗液槽具有基板接收和清洁部分和基板漂洗部分。 冲洗流体源和干燥蒸气源由在罐的漂洗部分上方的干燥箱包围。 因此,在时间上至少部分重叠地执行基板装载,清洁,漂洗,干燥和卸载。

    Apparatus for cleaning and drying substrates
    7.
    发明授权
    Apparatus for cleaning and drying substrates 有权
    用于清洁和干燥基材的设备

    公开(公告)号:US06328814B1

    公开(公告)日:2001-12-11

    申请号:US09280118

    申请日:1999-03-26

    IPC分类号: B08B304

    CPC分类号: H01L21/67028 Y10S134/902

    摘要: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.

    摘要翻译: 提供了一种用于清洗,漂洗和马兰戈尼干燥基材的方法和设备。 沿着形成空气/流体界面线的基底表面喷射流体线,并且将一线干燥蒸气供应到界面线以实现马兰戈尼干燥。 因此,大部分基板被同时干燥。 优选的装置采用清洁和/或冲洗流体箱。 在罐体流体上方,当衬底从清洁流体提升时,漂洗流体源将冲洗流体引导到在衬底表面上形成弯液面的衬底的表面,并且干燥蒸汽源将干燥蒸气引导到弯液面。 干燥蒸汽降低了弯液面的表面张力,引起从基材表面冲洗流体的马兰戈尼流,从而干燥基材。 清洗液槽具有基板接收和清洁部分和基板漂洗部分。 冲洗流体源和干燥蒸气源由在罐的漂洗部分上方的干燥箱包围。 因此,在时间上至少部分重叠地执行基板装载,清洁,漂洗,干燥和卸载。