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1.发明申请公开(公告)号：US20090244516A1
公开(公告)日：2009-10-01
申请号：US12309166
申请日：2007-07-09
Applicant: Manjusha Mehendale , Michael J. Kotelyanskii , Yanwen Hou , Jim Onderko , Guray Tas
Inventor： Manjusha Mehendale , Michael J. Kotelyanskii , Yanwen Hou , Jim Onderko , Guray Tas
IPC: G01B11/16
CPC classification number: G01N21/211 , G01N21/636 , G01N21/8422 , G01N21/9501 , G01N21/956
Abstract: A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.
Abstract translation: 一种方法包括选择执行椭偏仪或执行光学应力产生和检测之一。 该方法还包括响应于选择执行椭偏仪，将至少一个第一控制信号施加到至少修改光束的偏振的可控延迟器，以及使用修改的光束执行椭偏仪。 该方法还包括响应于选择执行光应力产生和检测，向可控延迟器施加至少一个第二控制信号，并且使用修改的光束进行光应力产生和检测。 还公开了装置和计算机可读介质。
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2.发明授权Multiple measurement techniques including focused beam scatterometry for characterization of samples 有权多重测量技术包括用于表征样品的聚焦光束散射法公开(公告)号：US08699027B2
公开(公告)日：2014-04-15
申请号：US13423866
申请日：2012-03-19
Applicant: Robert Gregory Wolf , Michael J. Kotelyanskii
Inventor： Robert Gregory Wolf , Michael J. Kotelyanskii
CPC classification number: G01N21/211 , G01B11/02 , G01B11/0625 , G01B11/0641 , G01B11/24 , G01B2210/56 , G01N21/4788 , G01N21/95607 , G01N2021/213
Abstract: A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.
Abstract translation: 本文公开了一种用于监测薄膜制造工艺的系统。 测量入射光的衍射，并将结果与基于至少一个理想化或标称结构的预测模型进行比较。 可以使用一个或多个附加计量系统的输出来修改衍射入射光的模型和/或测量。
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公开(公告)号：US09041931B2
公开(公告)日：2015-05-26
申请号：US13500692
申请日：2010-10-08
Applicant: Michael Colgan , Michael J. Kotelyanskii , Christopher J. Morath , Humphrey J. Maris
Inventor： Michael Colgan , Michael J. Kotelyanskii , Christopher J. Morath , Humphrey J. Maris
CPC classification number: G01N29/2418 , B82Y20/00 , B82Y35/00 , G01N29/041 , G01N29/12 , G01N2291/0423 , G01Q60/22
Abstract: A system for imposing and analyzing surface acoustic waves in a substrate to determine characteristics of the substrate is disclosed. Optical elements and arrangements for imposing and analyzing surface acoustic waves in a substrate are also disclosed. NSOM's, gratings, and nanolight elements may be used to impose surface acoustic waves in a substrate and may also be used to measure transient changes in the substrate due to the passage of surface acoustic waves therethrough.
Abstract translation: 公开了一种用于强化和分析衬底中表面声波以确定衬底特性的系统。 还公开了用于强化和分析衬底中表面声波的光学元件和布置。 NSOM，光栅和Nightight元件可以用于将表面声波施加在衬底中，并且还可以用于测量由于表面声波通过其中的衬底的瞬态变化。
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Patent Agency Ranking
4.发明申请MULTIPLE MEASUREMENT TECHNIQUES INCLUDING FOCUSED BEAM SCATTEROMETRY FOR CHARACTERIZATION OF SAMPLES 有权多重测量技术，包括用于表征样品的聚焦光束分析公开(公告)号：US20120268744A1
公开(公告)日：2012-10-25
申请号：US13423866
申请日：2012-03-19
Applicant: Robert Gregory WOLF , Michael J. KOTELYANSKII
Inventor： Robert Gregory WOLF , Michael J. KOTELYANSKII
IPC: G01N21/55
CPC classification number: G01N21/211 , G01B11/02 , G01B11/0625 , G01B11/0641 , G01B11/24 , G01B2210/56 , G01N21/4788 , G01N21/95607 , G01N2021/213
Abstract: A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.
Abstract translation: 本文公开了一种用于监测薄膜制造工艺的系统。 测量入射光的衍射，并将结果与基于至少一个理想化或标称结构的预测模型进行比较。 可以使用一个或多个附加计量系统的输出来修改衍射入射光的模型和/或测量。
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公开(公告)号：US20120309116A1
公开(公告)日：2012-12-06
申请号：US13500692
申请日：2010-10-08
Applicant: Michael Colgan , Michael J. Kotelyanskii , Christopher J. Morath , Humphrey J. Maris
Inventor： Michael Colgan , Michael J. Kotelyanskii , Christopher J. Morath , Humphrey J. Maris
CPC classification number: G01N29/2418 , B82Y20/00 , B82Y35/00 , G01N29/041 , G01N29/12 , G01N2291/0423 , G01Q60/22
Abstract: A system for imposing and analyzing surface acoustic waves in a substrate to determine characteristics of the substrate is disclosed. Optical elements and arrangements for imposing and analyzing surface acoustic waves in a substrate are also disclosed. NSOM's, gratings, and nanolight elements may be used to impose surface acoustic waves in a substrate and may also be used to measure transient changes in the substrate due to the passage of surface acoustic waves therethrough.
Abstract translation: 公开了一种用于强化和分析衬底中表面声波以确定衬底特性的系统。 还公开了用于强化和分析衬底中表面声波的光学元件和布置。 NSOM，光栅和Nightight元件可以用于将表面声波施加在衬底中，并且还可以用于测量由于表面声波通过其中的衬底的瞬态变化。
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6.发明授权Multiple measurement techniques including focused beam scatterometry for characterization of samples 有权多重测量技术包括用于表征样品的聚焦光束散射法公开(公告)号：US08139232B2
公开(公告)日：2012-03-20
申请号：US12309749
申请日：2007-07-27
Applicant: Robert Gregory Wolf , Michael J. Kotelyanskii
Inventor： Robert Gregory Wolf , Michael J. Kotelyanskii
CPC classification number: G01N21/211 , G01B11/24 , G01N21/47 , G01N21/9501 , G01N2021/213 , G01N2021/214 , G01N2021/8438
Abstract: A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.
Abstract translation: 本文公开了一种用于监测薄膜制造工艺的系统。 测量入射光的衍射，并将结果与基于至少一个理想化或标称结构的预测模型进行比较。 可以使用一个或多个附加计量系统的输出来修改衍射入射光的模型和/或测量。
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7.发明授权公开(公告)号：US07903238B2
公开(公告)日：2011-03-08
申请号：US12309166
申请日：2007-07-09
Applicant: Manjusha Mehendale , Michael J. Kotelyanskii , Yanwen Hou , Jim Onderko , Guray Tas
Inventor： Manjusha Mehendale , Michael J. Kotelyanskii , Yanwen Hou , Jim Onderko , Guray Tas
CPC classification number: G01N21/211 , G01N21/636 , G01N21/8422 , G01N21/9501 , G01N21/956
Abstract: A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.
Abstract translation: 一种方法包括选择执行椭偏仪或执行光学应力产生和检测之一。 该方法还包括响应于选择执行椭偏仪，将至少一个第一控制信号施加到至少修改光束的偏振的可控延迟器，以及使用修改的光束执行椭偏仪。 该方法还包括响应于选择执行光应力产生和检测，向可控延迟器施加至少一个第二控制信号，并且使用修改的光束进行光应力产生和检测。 还公开了装置和计算机可读介质。
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8.发明申请MULTIPLE MEASUREMENT TECHNIQUES INCLUDING FOCUSED BEAM SCATTEROMETRY FOR CHARACTERIZATION OF SAMPLES 有权多重测量技术，包括用于表征样品的聚焦光束分析公开(公告)号：US20090279090A1
公开(公告)日：2009-11-12
申请号：US12309749
申请日：2007-07-27
Applicant: Robert Gregory Wolf , Michael J. Kotelyanskii
Inventor： Robert Gregory Wolf , Michael J. Kotelyanskii
IPC: G01J4/00
CPC classification number: G01N21/211 , G01B11/24 , G01N21/47 , G01N21/9501 , G01N2021/213 , G01N2021/214 , G01N2021/8438
Abstract: A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.
Abstract translation: 本文公开了一种用于监测薄膜制造工艺的系统。 测量入射光的衍射，并将结果与基于至少一个理想化或标称结构的预测模型进行比较。 可以使用一个或多个附加计量系统的输出来修改衍射入射光的模型和/或测量。
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