公开(公告)号：US20240150923A1

公开(公告)日：2024-05-09

申请号：US18548773

申请日：2022-02-16

申请人： MTI GMBH

发明人： Markus HACKSTEINER

IPC分类号： C25D17/00 ,  C25D17/08

CPC分类号： C25D17/001 ,  C25D17/004 ,  C25D17/005 ,  C25D17/08

摘要： Described is a method for wet-chemical treatment of microchip substrates, wherein the microchip substrates are inserted into a holding device. The holding device is docked using an adapter onto a unit for wet-chemical treatment, such as metallization.

公开(公告)号：US20170350849A1

公开(公告)日：2017-12-07

申请号：US15522244

申请日：2015-10-19

申请人： MTI GmbH

发明人： Markus HACKSTEINER

IPC分类号： G01N27/416 ,  H01L21/66 ,  G01N17/02

CPC分类号： G01N27/416 ,  G01N17/00 ,  G01N17/02 ,  H01L22/14

摘要： In order to test wafers, microchips and the like, electrical and/or electrochemical properties thereof are periodically measured using electrochemical processes and are stored. The test values are compared with each other in order to determine changes in the properties. The method is carried out using an apparatus designed as a measuring cell and including a test chamber which is located between an upper half-cell and a lower half-cell and through which electrolyte is conducted. The test chamber is closed by a cell cover which simultaneously presses a wafer against an O-seal in the direction of the upper half-cell. The opening forming the test chamber in the lower half-cell is closed by an O-seal, an anode disk and an anode cover.