公开(公告)号：US07052665B2

公开(公告)日：2006-05-30

申请号：US10494313

申请日：2002-11-01

Applicant: Luc Fortier ,  Pierre Fournier ,  Serge Kaliaguine ,  Do Trong On

Inventor： Luc Fortier ,  Pierre Fournier ,  Serge Kaliaguine ,  Do Trong On

IPC: C01B33/26 ,  C01B33/12

CPC classification number: C01B37/02 ,  B01J20/10 ,  B01J20/103 ,  B01J20/28083 ,  B01J29/0308 ,  B01J29/041 ,  B01J29/89 ,  B01J35/002 ,  B01J35/1028 ,  B01J35/1047 ,  B01J35/1061 ,  B01J2229/40 ,  C01B37/00 ,  C01B37/005

Abstract: Highly ordered mesoporous silica molecular materials are prepared using sodium silicate as a silica source, sulfuric acid and nonionic poly(alkylene oxide) surfactants or nonionic amphiphilic bloc copolymers as structure-directing agents. The mesoporous silica materials obtained have hexagonal and cubic structures, uniform pore size and high surface areas.

Abstract translation: 使用硅酸钠作为二氧化硅源，硫酸和非离子聚（环氧烷）表面活性剂或非离子两亲性共聚物作为结构导向剂制备高度有序的介孔二氧化硅分子材料。 获得的介孔二氧化硅材料具有六方和立方结构，孔径均匀，表面积高。

公开(公告)号：US20050031520A1

公开(公告)日：2005-02-10

申请号：US10494313

申请日：2002-11-01

Applicant: Luc Fortier ,  Pierre Fournier ,  Serge Kaliaguine ,  Do Trong On

Inventor： Luc Fortier ,  Pierre Fournier ,  Serge Kaliaguine ,  Do Trong On

IPC: B01J20/10 ,  B01J29/03 ,  B01J29/04 ,  B01J29/89 ,  B01J35/10 ,  B01J37/03 ,  C01B37/00 ,  C01B37/02 ,  C01B33/26 ,  C01B33/18

CPC classification number: C01B37/02 ,  B01J20/10 ,  B01J20/103 ,  B01J20/28083 ,  B01J29/0308 ,  B01J29/041 ,  B01J29/89 ,  B01J35/002 ,  B01J35/1028 ,  B01J35/1047 ,  B01J35/1061 ,  B01J2229/40 ,  C01B37/00 ,  C01B37/005

Abstract: Highly ordered mesoporous silica molecular materials are prepared using sodium silicate as a silica source, sulfuric acid and nonionic poly(alkylene oxide) surfactants or nonionic amphiphilic bloc copolymers as structure-directing agents. The mesoporous silica materials obtained have hexagonal and cubic structures, uniform pore size and high surface areas.

Abstract translation: 使用硅酸钠作为二氧化硅源，硫酸和非离子聚（环氧烷）表面活性剂或非离子两亲性共聚物作为结构导向剂制备高度有序的介孔二氧化硅分子材料。 获得的介孔二氧化硅材料具有六方和立方结构，孔径均匀，表面积高。

公开(公告)号：US06248683B1

公开(公告)日：2001-06-19

申请号：US09287374

申请日：1999-04-07

Applicant: Luc Fortier ,  Simon Côté ,  Hugo St-Laurent ,  Simon Bernier ,  André Couture

Inventor： Luc Fortier ,  Simon Côté ,  Hugo St-Laurent ,  Simon Bernier ,  André Couture

IPC: B01J2034

CPC classification number: B01J38/50 ,  B01D15/203 ,  B01J21/20 ,  B01J38/02 ,  B01J38/60 ,  B01J38/70

Abstract: The present invention is concerned a process for the regeneration of the spent silica gel used in chromatography and for any other kind of silica. The process comprises 5 main steps, namely: washing with an extractant of organic compounds and removing volatile organic materials remaining thereafter; oxidation to oxidize organic compounds remaining and, preferably, bleach the material; washing with an acid to remove soluble inorganic matter; heating to dry the material and combust any remaining organic compounds present; and recovering the regenerated material. Various optional steps can be added to the process.

Abstract translation: 本发明涉及用于色谱法和任何其它种类二氧化硅的废硅胶再生方法。 该方法包括5个主要步骤，即：用有机化合物的萃取剂洗涤并除去其余的挥发性有机物质;氧化以氧化剩余的有机化合物，优选漂白材料;用酸洗涤以除去可溶性无机物质;加热至 干燥材料并燃烧存在的任何剩余的有机化合物; 并重新生成再生材料。可以在过程中添加各种可选步骤。