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1.发明申请公开(公告)号：US20100060888A1
公开(公告)日：2010-03-11
申请号：US12179260
申请日：2008-07-24
Applicant: Juergen Reich , Louis Vintro , Prasanna Dighe , Andrew Steinbach , Daniel Kavaldjiev , Stephen Biellak
Inventor： Juergen Reich , Louis Vintro , Prasanna Dighe , Andrew Steinbach , Daniel Kavaldjiev , Stephen Biellak
CPC classification number: H01L22/12 , G01N21/9501 , H01L2924/0002 , H01L2924/00
Abstract: Computer-implemented methods for inspecting and/or classifying a wafer are provided. One computer-implemented includes detecting defects on a wafer using one or more defect detection parameters, which are determined based on a non-spatially localized characteristic of the wafer that is determined using output responsive to light scattered from the wafer generated by an inspection system. Another computer-implemented method includes classifying a wafer based on a combination of a non-spatially localized characteristic of the wafer determined using output responsive to light scattered from the wafer generated by an inspection system and a spatially localized characteristic of the wafer determined using the output.
Abstract translation: 提供了用于检查和/或分类晶片的计算机实现的方法。 一种计算机实现的包括使用一个或多个缺陷检测参数来检测晶片上的缺陷，所述缺陷检测参数是基于使用响应于由检查系统产生的晶片散射的光的输出而确定的晶片的非空间局部特征确定的。 另一种计算机实现的方法包括基于使用响应于由检查系统产生的晶片散射的光的输出确定的晶片的非空间局部化特性和使用输出确定的晶片的空间局部化特性的组合来分类晶片 。
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2.发明授权公开(公告)号：US08269960B2
公开(公告)日：2012-09-18
申请号：US12179260
申请日：2008-07-24
Applicant: Juergen Reich , Louis Vintro , Prasanna Dighe , Andrew Steinbach , Daniel Kavaldjiev , Stephen Biellak
Inventor： Juergen Reich , Louis Vintro , Prasanna Dighe , Andrew Steinbach , Daniel Kavaldjiev , Stephen Biellak
IPC: G01N21/00
CPC classification number: H01L22/12 , G01N21/9501 , H01L2924/0002 , H01L2924/00
Abstract: Computer-implemented methods for inspecting and/or classifying a wafer are provided. One computer-implemented includes detecting defects on a wafer using one or more defect detection parameters, which are determined based on a non-spatially localized characteristic of the wafer that is determined using output responsive to light scattered from the wafer generated by an inspection system. Another computer-implemented method includes classifying a wafer based on a combination of a non-spatially localized characteristic of the wafer determined using output responsive to light scattered from the wafer generated by an inspection system and a spatially localized characteristic of the wafer determined using the output.
Abstract translation: 提供了用于检查和/或分类晶片的计算机实现的方法。 一种计算机实现的包括使用一个或多个缺陷检测参数来检测晶片上的缺陷，所述缺陷检测参数是基于使用响应于由检查系统产生的晶片散射的光的输出而确定的晶片的非空间局部特征确定的。 另一种计算机实现的方法包括基于使用响应于由检查系统产生的晶片散射的光的输出确定的晶片的非空间局部化特性和使用输出确定的晶片的空间局部化特性的组合来分类晶片 。
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3.发明授权Computer-implemented methods, computer-readable media, and systems for determining one or more characteristics of a wafer 有权计算机实现的方法，计算机可读介质和用于确定晶片的一个或多个特性的系统公开(公告)号：US08494802B2
公开(公告)日：2013-07-23
申请号：US13000013
申请日：2009-06-19
Applicant: Haiguang Chen , Daniel Kavaldjiev , Louis Vintro , George Kren
Inventor： Haiguang Chen , Daniel Kavaldjiev , Louis Vintro , George Kren
IPC: G06F19/00
CPC classification number: G01N21/9501 , G06T7/001 , G06T2207/30148
Abstract: Computer-implemented methods, computer-readable media, and systems for determining one or more characteristics of a wafer are provided.
Abstract translation: 提供了计算机实现的方法，计算机可读介质和用于确定晶片的一个或多个特性的系统。
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4.发明申请COMPUTER-IMPLEMENTED METHODS, COMPUTER-READABLE MEDIA, AND SYSTEMS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF A WAFER 有权计算机实现方法，计算机可读介质和用于确定一个或多个特征的系统公开(公告)号：US20110196639A1
公开(公告)日：2011-08-11
申请号：US13000013
申请日：2009-06-19
Applicant: Haiguang Chen , Daniel Kavaldjiev , Louis Vintro , George Kren
Inventor： Haiguang Chen , Daniel Kavaldjiev , Louis Vintro , George Kren
IPC: G06F19/00
CPC classification number: G01N21/9501 , G06T7/001 , G06T2207/30148
Abstract: Computer-implemented methods, computer-readable media, and systems for determining one or more characteristics of a wafer are provided.
Abstract translation: 提供了计算机实现的方法，计算机可读介质和用于确定晶片的一个或多个特性的系统。
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