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1.
公开(公告)号:US09053897B2
公开(公告)日:2015-06-09
申请号:US13991427
申请日:2011-12-14
CPC分类号: H01J35/105 , H01J9/02 , H01J35/08 , H01J35/10 , H01J35/108 , H01J35/12 , H01J2235/081 , H01J2235/084
摘要: An anode (30) is formed by building a carbon, such as a carbon reinforced carbon composite, or other ceramic substrate (50). A ductile, refractory metal is electroplated on the ceramic substrate to form a refractory metal carbide layer (52) and a ductile refractory metal layer (54), at least on a focal track portion (36). A high-Z refractory metal is vacuum plasma sprayed on the ductile refractory metal layer to form a vacuum plasma sprayed high-Z refractory metal layer (56), at least on the focal track portion.
摘要翻译: 阳极(30)通过构造碳(例如碳增强碳复合材料)或其它陶瓷基板(50)而形成。 至少在焦点轨迹部分(36)上,在陶瓷基片上电镀延性难熔金属以形成难熔金属碳化物层(52)和延性难熔金属层(54)。 高Z难熔金属是真空等离子体喷涂在韧性难熔金属层上,以形成至少在焦点轨道部分上的真空等离子体喷涂的高Z难熔金属层(56)。
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2.
公开(公告)号:US20130259205A1
公开(公告)日:2013-10-03
申请号:US13991427
申请日:2011-12-14
CPC分类号: H01J35/105 , H01J9/02 , H01J35/08 , H01J35/10 , H01J35/108 , H01J35/12 , H01J2235/081 , H01J2235/084
摘要: An anode (30) is formed by building a carbon, such as a carbon reinforced carbon composite, or other ceramic substrate (50). A ductile, refractory metal is electroplated on the ceramic substrate to form a refractory metal carbide layer (52) and a ductile refractory metal layer (54), at least on a focal track portion (36). A high-Z refractory metal is vacuum plasma sprayed on the ductile refractory metal layer to forma vacuum plasma sprayed high-Z refractory metal layer (56), at least on the focal track portion.
摘要翻译: 阳极(30)通过构造碳(例如碳增强碳复合材料)或其它陶瓷基板(50)而形成。 至少在焦点轨迹部分(36)上,在陶瓷基片上电镀延性难熔金属以形成难熔金属碳化物层(52)和延性难熔金属层(54)。 高Z耐火金属是真空等离子体喷涂在韧性难熔金属层上,以形成至少在焦轨道部分上的真空等离子体喷涂的高Z难熔金属层(56)。
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公开(公告)号:US07580507B2
公开(公告)日:2009-08-25
申请号:US10596964
申请日:2005-01-05
IPC分类号: H01J35/10
摘要: A housing (30) surrounds at least a portion of an x-ray tube (1). A cooling system (32, 32′) supplies a cooling liquid through the housing. The cooling system includes a pump (40, 40′) and a flow sensor system (60, 60′) which measures a pressure difference across the pump. A processor (80, 80′, 82, 82′) determines a cooling fluid flow rate from the pressure difference. A controller (81, 81′, 82, 82′, 107) limits operation of the x-ray tube based on the cooling fluid flow rate and a measured temperature of the cooling fluid to prevent x-ray tube overheating while minimizing cooling time between x-ray tube operations.
摘要翻译: 壳体(30)围绕X射线管(1)的至少一部分。 冷却系统(32,32')通过壳体供应冷却液。 冷却系统包括泵(40,40')和测量泵两端的压力差的流量传感器系统(60,60')。 处理器(80,80',82,82')从压力差确定冷却流体流量。 控制器(81,81',82,82',107)基于冷却流体流速和冷却流体的测量温度来限制X射线管的操作,以防止X射线管过热,同时最小化冷却时间 x射线管操作。
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