Resist composition and pattern forming method using the same
    1.
    发明授权
    Resist composition and pattern forming method using the same 有权
    抗蚀剂组合物和图案形成方法使用其

    公开(公告)号:US07691560B2

    公开(公告)日:2010-04-06

    申请号:US11727002

    申请日:2007-03-23

    IPC分类号: G03F7/00

    摘要: A resist composition comprising at least one kind of a nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group, an ammonium salt compound having a phenoxy group, an amine compound having a sulfonic acid ester group and an ammonium salt compound having a sulfonic acid ester group; and a pattern forming method using the composition.

    摘要翻译: 一种抗蚀剂组合物,其包含至少一种选自具有苯氧基的胺化合物,具有苯氧基的铵盐化合物,具有磺酸酯基的胺化合物和铵盐的含氮化合物 具有磺酸酯基的化合物; 以及使用该组合物的图案形成方法。