公开(公告)号：US20130285551A1

公开(公告)日：2013-10-31

申请号：US13526484

申请日：2012-06-18

申请人： Bo Wang ,  Lichun Xu ,  Ming Zhang ,  Ruzhi Wang ,  Xuemei Song ,  Yudong Hou ,  Mankong Zhu ,  Jingbing Liu ,  Hao Wang ,  Hui Yan

发明人： Bo Wang ,  Lichun Xu ,  Ming Zhang ,  Ruzhi Wang ,  Xuemei Song ,  Yudong Hou ,  Mankong Zhu ,  Jingbing Liu ,  Hao Wang ,  Hui Yan

IPC分类号： H05H1/46

CPC分类号： C23C16/24 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32155

摘要： A method for improving the uniformity of high-frequency discharge plasma by means of frequency modulation is disclosed. In a plasma discharge chamber, there is a pair of parallel electrodes. A high-frequency power supply is adopted to feed the electrodes. The frequency range of the electromagnetic field is 13.56 MHz˜160 MHz. Discharge gas is input to form plasma. The frequency of the fed-in high-frequency electromagnetic field is under automatic tuning control, and keeps changing cyclically without stop in the course of plasma discharge. The range of the frequency change may fall into either a portion of or the entire range of 13.56 MHz˜160 MHz and makes the locations with higher plasma density on the plane in parallel with the electrodes and in the plasma discharge space changed cyclically. In a time slot longer than one frequency change cycle, the average plasma density between the parallel electrodes is uniform.

摘要翻译： 公开了一种通过频率调制来改善高频放电等离子体的均匀性的方法。 在等离子体放电室中存在一对平行电极。 采用高频电源供电电极。 电磁场的频率范围为13.56MHz〜160MHz。 输入放电气体以形成等离子体。 馈电高频电磁场的频率处于自动调谐控制状态，并且在等离子体放电过程中不停止地循环变化。 频率变化的范围可以落入13.56MHz〜160MHz的一部分或全部范围，并且使得与电极平行的平面上的等离子体密度较高的位置和等离子体放电空间中的位置周期性地变化。 在长于一个频率变化周期的时隙中，平行电极之间的平均等离子体密度是均匀的。

公开(公告)号：US08704445B2

公开(公告)日：2014-04-22

申请号：US13526484

申请日：2012-06-18

申请人： Bo Wang ,  Lichun Xu ,  Ming Zhang ,  Ruzhi Wang ,  Xuemei Song ,  Yudong Hou ,  Mankang Zhu ,  Jingbing Liu ,  Hao Wang ,  Hui Yan

发明人： Bo Wang ,  Lichun Xu ,  Ming Zhang ,  Ruzhi Wang ,  Xuemei Song ,  Yudong Hou ,  Mankang Zhu ,  Jingbing Liu ,  Hao Wang ,  Hui Yan

IPC分类号： H01J7/24

CPC分类号： C23C16/24 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32155

摘要： A method for improving the uniformity of high-frequency discharge plasma by means of frequency modulation is disclosed. In a plasma discharge chamber, there is a pair of parallel electrodes. A high-frequency power supply is adopted to feed the electrodes. The frequency range of the electromagnetic field is 13.56 MHz˜160 MHz. Discharge gas is input to form plasma. The frequency of the fed-in high-frequency electromagnetic field is under automatic tuning control, and keeps changing cyclically without stop in the course of plasma discharge. The range of the frequency change may fall into either a portion of or the entire range of 13.56 MHz˜160 MHz and makes the locations with higher plasma density on the plane in parallel with the electrodes and in the plasma discharge space changed cyclically. In a time slot longer than one frequency change cycle, the average plasma density between the parallel electrodes is uniform.

摘要翻译： 公开了一种通过频率调制来改善高频放电等离子体的均匀性的方法。 在等离子体放电室中存在一对平行电极。 采用高频电源供电电极。 电磁场的频率范围为13.56MHz〜160MHz。 输入放电气体以形成等离子体。 馈电高频电磁场的频率处于自动调谐控制状态，并且在等离子体放电过程中不停止地循环变化。 频率变化的范围可以落入13.56MHz〜160MHz的一部分或全部范围，并且使得与电极平行的平面上的等离子体密度较高的位置和等离子体放电空间周期性地变化。 在长于一个频率变化周期的时隙中，平行电极之间的平均等离子体密度是均匀的。