公开(公告)号：US07259380B2

公开(公告)日：2007-08-21

申请号：US11155973

申请日：2005-06-17

申请人： Jinsong Wang ,  Yu Zhu ,  Jianyong Cao ,  Wensheng Yin ,  Guanghong Duan

发明人： Jinsong Wang ,  Yu Zhu ,  Jianyong Cao ,  Wensheng Yin ,  Guanghong Duan

IPC分类号： G21K5/10 ,  G01K5/08 ,  G01F23/00

CPC分类号： H01L21/68764 ,  H01J2237/20207 ,  H01J2237/20228 ,  H01J2237/20278 ,  H01J2237/31701 ,  H01L21/67213 ,  H01L21/68

摘要： This invention discloses a scanning mechanism of an ion implanter. The mechanism is a PR-PRR type parallel mechanism with two subchains and two DOFs, driving the wafer holder to scan when the first subchain and the second subchain are translated in the same direction at the same speed and adjusting the rotational angle of the wafer holder when the first moving link (30) and the second moving link (32) in the first subchain and the second subchain have different translation amounts in the same direction or opposite directions. The driving motor for the scanning mechanism is provided outside the implant chamber. The invention also solves problems like low rigidity and large accumulation errors of existing serial scanning mechanisms and the effect of the electromagnetic field of the motor within the ion implant chamber on the trajectory of the ion beam.

摘要翻译： 本发明公开了一种离子注入机的扫描机构。 该机构是具有两个子链和两个DOF的PR-PRR型并行机构，当第一子链和第二子链以相同的速度在相同方向上平移时驱动晶片保持器进行扫描，并调整晶片保持器的旋转角度 当第一子链和第二子链中的第一移动链路（30）和第二移动链路（32）在相同方向或相反方向上具有不同的平移量时。 用于扫描机构的驱动电机设置在植入室的外侧。 本发明还解决了现有串行扫描机构的低刚性和大的累积误差以及离子注入室内电动机的电磁场对离子束轨迹的影响的问题。

公开(公告)号：US20050285052A1

公开(公告)日：2005-12-29

申请号：US11155973

申请日：2005-06-17

申请人： Jinsong Wang ,  Yu Zhu ,  Jianyong Cao ,  Wensheng Yin ,  Guanghong Duan

发明人： Jinsong Wang ,  Yu Zhu ,  Jianyong Cao ,  Wensheng Yin ,  Guanghong Duan

IPC分类号： A61N5/00 ,  G21K5/10 ,  H01J37/317 ,  H01L21/00 ,  H01L21/265 ,  H01L21/68 ,  H01L21/687

CPC分类号： H01L21/68764 ,  H01J2237/20207 ,  H01J2237/20228 ,  H01J2237/20278 ,  H01J2237/31701 ,  H01L21/67213 ,  H01L21/68

摘要： This invention discloses a scanning mechanism of an ion implanter. The mechanism is a PR-PRR type parallel mechanism with two subchains and two DOFs, driving the wafer holder to scan when the first subchain and the second subchain are translated in the same direction at the same speed and adjusting the rotational angle of the wafer holder when the first moving link (30) and the second moving link (32) in the first subchain and the second subchain have different translation amounts in the same direction or opposite directions. The driving motor for the scanning mechanism is provided outside the implant chamber. The invention also solves problems like low rigidity and large accumulation errors of existing serial scanning mechanisms and the effect of the electromagnetic field of the motor within the ion implant chamber on the trajectory of the ion beam.

摘要翻译： 本发明公开了一种离子注入机的扫描机构。 该机构是具有两个子链和两个DOF的PR-PRR型并行机构，当第一子链和第二子链以相同的速度在相同方向平移时驱动晶片保持器进行扫描，并且调整晶片保持器的旋转角度 当第一子链和第二子链中的第一移动链路（30）和第二移动链路（32）在相同方向或相反方向上具有不同的平移量时。 用于扫描机构的驱动电机设置在植入室的外侧。 本发明还解决了现有串行扫描机构的低刚性和大的累积误差以及离子注入室内电动机电磁场对离子束轨迹的影响的问题。