公开(公告)号：US08633138B2

公开(公告)日：2014-01-21

申请号：US13139947

申请日：2009-12-18

申请人： Philippe Odier ,  Stéphanie Morlens ,  Cyril Millon ,  Tristan Caroff ,  Carmen Jimenez ,  Jean-Louis Soubeyroux ,  Arnaud Allais ,  Mark Rikel

发明人： Philippe Odier ,  Stéphanie Morlens ,  Cyril Millon ,  Tristan Caroff ,  Carmen Jimenez ,  Jean-Louis Soubeyroux ,  Arnaud Allais ,  Mark Rikel

IPC分类号： H01L39/24

CPC分类号： H01L39/2461 ,  C23C18/04 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1241 ,  C23C18/1279 ,  C23C18/1295 ,  H01L39/2441

摘要： Method of depositing a buffer layer of epitaxial metal oxide on a functionalised surface of a textured metal substrate, said method comprising the following steps: (1) a layer is deposited of a precursor of an oxide of the type A2−xB2+xO7 where A represents a metal of valency 3 or a mixture of several of these metals, and B a metal of valency 4, and x is a number between −0.1 and +0.1, from a solution of carboxylates of said metals A and B, (2) said layer of oxide precursor is left to dry, (3) heat treatment is carried out in order to pyrolyse said oxide precursor and to form the oxide, at least part of said heat treatment being carried out under a flow of reducing gas.

摘要翻译： 在织构化的金属衬底的功能化表面上沉积外延金属氧化物的缓冲层的方法，所述方法包括以下步骤：（1）沉积A2-xB2 + xO7型氧化物前体的层，其中A 表示金属3的金属或这些金属的几种的混合物，和B是金属A和B的羧酸盐溶液中的价态4的金属，x是-0.1和+ 0.1之间的数字，（2） 所述氧化物前体层要干燥，（3）进行热处理以热解所述氧化物前体并形成氧化物，所述热处理的至少一部分在还原气体流下进行。

公开(公告)号：US08642511B2

公开(公告)日：2014-02-04

申请号：US13139961

申请日：2009-12-18

申请人： Philippe Odier ,  Stéphanie Morlens ,  Cyril Millon ,  Sarah Petit ,  Tristan Caroff ,  Carmen Jimenez ,  Jean-Louis Soubeyroux ,  Arnaud Allais ,  Mark Rikel

发明人： Philippe Odier ,  Stéphanie Morlens ,  Cyril Millon ,  Sarah Petit ,  Tristan Caroff ,  Carmen Jimenez ,  Jean-Louis Soubeyroux ,  Arnaud Allais ,  Mark Rikel

IPC分类号： H01L39/24

CPC分类号： H01L39/2461 ,  C23C18/04 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1241 ,  C23C18/1279 ,  C23C18/1295 ,  H01L39/2441

摘要： Method of depositing a layer of oxide of at least one metal element on a curved surface of a textured metal substrate, said method comprising the following steps: (1) a layer of a precursor of at least one oxide of a metal is deposited using an organic solution of at least one precursor of said metal, this solution preferably having a viscosity, measured at the temperature of the method, of between 1 mPa s and 20 mPa s, and even more preferentially between 2 mPa s and 10 mPa s. (2) said layer of oxide precursor is left to dry, (3) heat treatment is carried out in order to pyrolyse said oxide precursor and to form the oxide, at least part of said heat treatment being carried out under a flow of reducing gas, said reducing gas preferably having a flow rate greater than 0.005 cm/s, preferentially between 0.012 cm/s and 0.1 cm/s, and even more preferentially between 0.04 cm/s and 0.08 cm/s.

摘要翻译： 在纹理化金属基底的弯曲表面上沉积至少一种金属元素的氧化物层的方法，所述方法包括以下步骤：（1）至少一种金属氧化物的前体层，使用 所述金属的至少一种前体的有机溶液，该溶液优选具有在该方法温度下测得的粘度为1mPa·s至20mPa·s，甚至更优选在2mPa·s至10mPa·s之间。 （2）使所述氧化物前体层干燥，（3）进行热处理以热解所述氧化物前体并形成氧化物，所述热处理的至少一部分在还原气体流下进行 所述还原气体优选具有大于0.005cm / s的流速，优选在0.012cm / s至0.1cm / s之间，甚至更优选在0.04cm / s至0.08cm / s之间。

公开(公告)号：US20120028810A1

公开(公告)日：2012-02-02

申请号：US13139961

申请日：2009-12-18

申请人： Philippe Odier ,  Stéphanie Morlens ,  Cyril Millon ,  Sarah Petil ,  Tristan Caroff ,  Carmen Jimenez ,  Jean-Louis Soubeyroux ,  Arnaud Allais ,  Mark Rikel

发明人： Philippe Odier ,  Stéphanie Morlens ,  Cyril Millon ,  Sarah Petil ,  Tristan Caroff ,  Carmen Jimenez ,  Jean-Louis Soubeyroux ,  Arnaud Allais ,  Mark Rikel

IPC分类号： H01L39/24 ,  H01L21/31

CPC分类号： H01L39/2461 ,  C23C18/04 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1241 ,  C23C18/1279 ,  C23C18/1295 ,  H01L39/2441

摘要： Method of depositing a layer of oxide of at least one metal element on a curved surface of a textured metal substrate, said method comprising the following steps: (1) a layer of a precursor of at least one oxide of a metal is deposited using an organic solution of at least one precursor of said metal, this solution preferably having a viscosity, measured at the temperature of the method, of between 1 mPa s and 20 mPa s, and even more preferentially between 2 mPa s and 10 mPa s. (2) said layer of oxide precursor is left to dry, (3) heat treatment is carried out in order to pyrolyse said oxide precursor and to form the oxide, at least part of said heat treatment being carried out under a flow of reducing gas, said reducing gas preferably having a flow rate greater than 0.005 cm/s, preferentially between 0.012 cm/s and 0.1 cm/s, and even more preferentially between 0.04 cm/s and 0.08 cm/s.

摘要翻译： 在纹理化金属基底的弯曲表面上沉积至少一种金属元素的氧化物层的方法，所述方法包括以下步骤：（1）至少一种金属氧化物的前体层，使用 所述金属的至少一种前体的有机溶液，该溶液优选具有在该方法温度下测得的粘度为1mPa·s至20mPa·s，甚至更优选在2mPa·s至10mPa·s之间。 （2）使所述氧化物前体层干燥，（3）进行热处理以热解所述氧化物前体并形成氧化物，所述热处理的至少一部分在还原气体流下进行 所述还原气体优选具有大于0.005cm / s的流速，优选在0.012cm / s至0.1cm / s之间，甚至更优选在0.04cm / s至0.08cm / s之间。

公开(公告)号：US4389326A

公开(公告)日：1983-06-21

申请号：US272943

申请日：1981-06-12

申请人： Bernard Tanguy ,  Jean-Louis Soubeyroux ,  Michel Pezat ,  Josik Portier ,  Paul Hagenmuller

发明人： Bernard Tanguy ,  Jean-Louis Soubeyroux ,  Michel Pezat ,  Josik Portier ,  Paul Hagenmuller

IPC分类号： C01B3/00 ,  C22C1/04 ,  C01B6/00 ,  C01B6/04

CPC分类号： C01B3/0005 ,  C01B3/0078 ,  C22C1/04 ,  B22F2998/00 ,  Y02E60/324

摘要： There is provided an efficient method of storing hydrogen in materials of small mass and small volume. The products of the present invention comprise intimate mixtures (as opposed to alloys) of magnesium and other metals or alloys capable of forming hydrides. The hydrides are selected so that the hydrides have a substantially lower thermal stability than that of magnesium hydride.

摘要翻译： 提供了一种在质量小，体积小的材料中储存氢的有效方法。 本发明的产品包括与能够形成氢化物的镁和其它金属或合金的合金（与合金相反）。 选择氢化物使得氢化物具有比氢化镁基本上更低的热稳定性。