公开(公告)号：US20160077437A1

公开(公告)日：2016-03-17

申请号：US14484333

申请日：2014-09-12

Applicant: Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

Inventor： Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

IPC: G03F7/38 ,  B41C1/10

CPC classification number: G03F7/38 ,  B41C1/1008 ,  G03F7/32

Abstract: Lithographic printing plates are provided by imagewise exposing negative-working lithographic printing plate precursors having a negative-working radiation-sensitive imageable layer, followed by contacting with a processing solution that has a pH of at least 7 and up to and including 11. This processing solution also includes component (1) that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40° C.; component (2) that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40° C.; component (3) that is a hydroxy-containing solution promoter; and component (4) that is a hydrophilic surface protective compound. The method is carried out in a manner such that the exposed and processed precursor is not further treated with any liquid (such as gumming or rinsing solution) between processing and mounting onto a printing press.

Abstract translation: 平版印刷版通过成像曝光具有负性辐射敏感可成像层的负性平版印刷版原版提供，然后与pH至少为7且高达11并且包括11的处理溶液接触。这种处理 溶液还包括作为大气压熔点至少为40℃的含氮碱的组分（1）。 组分（2），其是独立地具有至少40℃的大气压熔点，玻璃化转变温度或倾点的非离子表面活性剂。 作为含羟基溶液促进剂的组分（3）; 和作为亲水性表面保护性化合物的成分（4）。 该方法以这样的方式进行，使得在处理和安装到印刷机上之前，曝光和加工的前体不被任何液体（例如上胶或漂洗溶液）进一步处理。

公开(公告)号：US20150099229A1

公开(公告)日：2015-04-09

申请号：US14044912

申请日：2013-10-03

Applicant: Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Michael Flugel

Inventor： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Michael Flugel

IPC: G03F7/033 ,  G03F7/20

CPC classification number: G03F7/033 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/24 ,  G03F7/0388 ,  G03F7/20

Abstract: Negative-working lithographic printing plate precursors have improved bakeability and good shelf life and can be imaged using either UV or infrared radiation. These precursors have a negative-working imageable layer that has a unique polymeric binder comprising a polymeric backbone and further comprising at least (a) and (b) pendant groups distributed in random order along the polymeric backbone. The (a) pendant groups are ethylenically unsaturated polymerizable groups, and the (b) pendant groups are defined by Structures (I), (II), and (III) described in the disclosure.

Abstract translation: 负性平版印刷版前体具有改善的烘烤性和良好的保质期，并且可以使用UV或红外辐射成像。 这些前体具有负性可成像层，其具有包含聚合物主链的独特聚合物粘合剂，并且还包含至少（a）和（b）沿聚合物主链以随机顺序分布的侧基。 （a）侧基是烯属不饱和可聚合基团，（b）侧基由本发明中描述的结构（I），（II）和（III）定义。

公开(公告)号：US20140135577A1

公开(公告)日：2014-05-15

申请号：US14079037

申请日：2013-11-13

Applicant: Harald Baumann ,  Joachim Reinacher

Inventor： Harald Baumann ,  Joachim Reinacher

IPC: A61B1/055

CPC classification number: A61B1/055 ,  A61B1/00096 ,  A61B1/00179 ,  G02B5/04 ,  G02B23/243

Abstract: An instrument includes a hollow body with an internal diameter and an optoelectronic image recording system, which is arranged in an end region of the body and has a lens system on an image entrance side. The lens system has a cylindrical section and an image sensor. An external diameter of the cylindrical section is less than the internal diameter of the body, such that an interspace remains between an inner side of the body and an outer side of the lens system, providing access in the body for components. With a viewing direction of 0° to 90° from the optical axis of the lens system, a deflection prism is arranged on the image entrance side at the lens system, and has a section extending laterally beyond the external diameter of the cylindrical section. An image entrance plane of the image sensor runs approximately parallel to the optical axis.

Abstract translation: 仪器包括具有内径的中空体和光电子图像记录系统，其布置在身体的端部区域中，并且在图像入口侧具有透镜系统。 透镜系统具有圆柱形部分和图像传感器。 圆柱形部分的外径小于主体的内径，使得间隙保持在主体的内侧和透镜系统的外侧之间，从而在主体中提供组件的通路。 从透镜系统的光轴观察方向为0°至90°时，偏转棱镜布置在透镜系统的图像入射侧，并且具有横向延伸超过圆柱形部分的外径的部分。 图像传感器的图像入射面大致平行于光轴延伸。

公开(公告)号：US08632941B2

公开(公告)日：2014-01-21

申请号：US13239442

申请日：2011-09-22

Applicant: Domenico Balbinot ,  Harald Baumann ,  Udo Dwars ,  Mathias Jarek ,  James R. Matz ,  Christopher D. Simpson

Inventor： Domenico Balbinot ,  Harald Baumann ,  Udo Dwars ,  Mathias Jarek ,  James R. Matz ,  Christopher D. Simpson

IPC: B41N1/00 ,  G03F7/00 ,  G03F7/26 ,  B41M5/00

CPC classification number: B41C1/10 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/3035

Abstract: A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye that is defined by Structure (I) shown in the disclosure, which dyes comprise one or more ethylenically unsaturated polymerizable groups in an organic group that is attached to the methine chain. These infrared radiation absorbing dyes exhibit a reduced tendency to crystallize in the imageable layers in the presence of tetraaryl borate counter anions and therefore provide improved shelf life.

Abstract translation: 平版印刷版前体包含可成像层，其包含可自由基聚合的组分，在暴露于成像红外辐射时能够产生自由基的引发剂组合物，由本公开中所示的结构（I）定义的红外辐射吸收染料， 染料在与次甲基链连接的有机基团中包含一个或多个烯键式不饱和可聚合基团。 这些红外辐射吸收染料在硼酸四芳基酯阴离子存在下，在可成像层中显示出降低的结晶倾向，因此提供了更好的保质期。

公开(公告)号：US20120231394A1

公开(公告)日：2012-09-13

申请号：US13480634

申请日：2012-05-25

Applicant: Christopher D. Simpson ,  Harald Baumann ,  Joachim Pengler ,  Michael Flugel

Inventor： Christopher D. Simpson ,  Harald Baumann ,  Joachim Pengler ,  Michael Flugel

IPC: G03F7/20

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/266 ,  B41M5/284 ,  G03F7/105

Abstract: Both positive-working and negative-working imageable element can have a radiation-sensitive imageable layer that has at least one pigment colorant that does not change color when heated, and at least one dye that can change color when heated. The dye is soluble in the solvent or mixture of solvents used to coat the radiation-sensitive imageable layer on a substrate and the pigment colorant is not. This combination of pigment colorant and dye provide excellent image contrast after imaging, development, and postbaking. The pigment colorant and the dye independently have a maximum absorption of from about 480 to about 700 nm.

Abstract translation: 正性和负型可成像元件都可以具有辐射敏感的可成像层，其具有至少一种在加热时不改变颜色的颜料着色剂，以及至少一种当加热时可以改变颜色的染料。 染料可溶于用于涂覆基材上的辐射敏感可成像层的溶剂或溶剂混合物，并且颜料着色剂不是。 这种颜料着色剂和染料的组合在成像，显影和后烘后提供了出色的图像对比度。 颜料着色剂和染料独立地具有约480至约700nm的最大吸收。

公开(公告)号：US20120141941A1

公开(公告)日：2012-06-07

申请号：US12959424

申请日：2010-12-03

Applicant: Mathias Jarek ,  Domenico Balbinot ,  Harald Baumann

Inventor： Mathias Jarek ,  Domenico Balbinot ,  Harald Baumann

IPC: G03F7/20 ,  G03C7/407

CPC classification number: G03F7/3071 ,  G03F7/322

Abstract: Imaged lithographic printing plates are processed using a developer that is replenished with only water, but replenishment is at a rate to allow developer volume to slowly decrease from a developer reservoir. This allows for a longer processing cycle especially when the developer is supplied from a container having a defined amount and applied using spray devices where water evaporation from the developer can be significant. Water lost by evaporation is replenished while water carried out by lithographic printing plates is not replenished.

Abstract translation: 使用仅补充水的显影剂对成像的平版印刷版进行处理，但补充量使得显影剂体积从显影剂储存器缓慢降低。 这特别是当显影剂从具有限定量的容器供应并且使用喷雾装置施加显影剂时，可以延长处理周期，其中来自显影剂的水蒸发可能是显着的。 补充水蒸气损失的水分，而平版印刷版的水不补充。

公开(公告)号：US08119331B2

公开(公告)日：2012-02-21

申请号：US12159287

申请日：2007-01-02

Applicant: Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

Inventor： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

IPC: G03F7/09 ,  G03F7/30 ,  G03F7/004

CPC classification number: G03F7/027 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368

Abstract: Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

Abstract translation: 辐射敏感元件包括基材和辐射敏感涂层，其包含（a）选自光引发剂和敏化剂/共引发剂体系中的至少一种成分，其吸收波长在250-1200nm范围内的辐射; （b）由三异氰酸酯与（i）至少一种丙烯酸或甲基丙烯酸单体与两个游离OH基团反应得到的至少一种平均分子量在3,500-9,000范围内的可自由基聚合的低聚物A， 至少一种（甲基）丙烯酸基和（ii）分子中至少一种含有一个OH基，至少一个（甲基）丙烯酸基和至少一个聚（环氧烷）链的化合物，其中（甲基）丙烯酸单体 基于具有OH官能度的（甲基）丙烯酸酯化合物的总量，i）的存在量为2至20摩尔％。

公开(公告)号：US08105755B2

公开(公告)日：2012-01-31

申请号：US12300206

申请日：2007-06-05

Applicant: Harald Baumann ,  Christopher D. Simpson ,  Ulrich Fiebag ,  Bernd Strehmel

Inventor： Harald Baumann ,  Christopher D. Simpson ,  Ulrich Fiebag ,  Bernd Strehmel

IPC: G03F7/00 ,  G03F7/26 ,  G03C5/26 ,  B41N1/00

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/09 ,  G03F7/322

Abstract: Method is described for producing an imaged lithographic printing plate from a precursor comprising a free-radical polymerizable coating and an oxygen-impermeable overcoat, characterized in that removing the overcoat, developing and gumming is carried out in one single step.

Abstract translation: 描述了用于从包含自由基可聚合涂层和不透氧外涂层的前体制备成像平版印刷版的方法，其特征在于，在一个单一步骤中进行外涂层，显影和涂胶的去除。

公开(公告)号：US20110189600A1

公开(公告)日：2011-08-04

申请号：US12696088

申请日：2010-01-29

Applicant: Lars Plumer ,  Pavel Korolik ,  Danny Koifman ,  Harald Baumann ,  Bernd Strehmel

Inventor： Lars Plumer ,  Pavel Korolik ,  Danny Koifman ,  Harald Baumann ,  Bernd Strehmel

IPC: G03F7/20

CPC classification number: B41C1/1083

Abstract: The invention relates to processing imaged precursors such as lithographic printing plates. The invention relates specifically to adjusting a processing device for optimal processing performance using a plate recognition system that includes a senseing and authenication subsystem. The processor is automated to make adjustments according to the information provided.

Abstract translation: 本发明涉及加工成像的前体，如平版印刷版。 本发明具体涉及使用包括感知和认知子系统的板识别系统来调整处理装置以获得最佳处理性能。 处理器可以根据所提供的信息进行自动调整。

公开(公告)号：US07955776B2

公开(公告)日：2011-06-07

申请号：US11995213

申请日：2006-07-03

Applicant: Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

Inventor： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

IPC: G03F7/26 ,  G03F7/00

CPC classification number: G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41M5/41 ,  B41M5/42 ,  B41M2205/40

Abstract: Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

Abstract translation: 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）式（I）的至少一种低聚物A，其中X 1，X 2和X 3独立地选自直链或环状的C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和两个或多个 上述更多的R 1，R 2和R 3独立地选自（II）和（III），条件是（1）在R1，R2和R3中的至少一个中n = 0，和（2）n> 2中的至少一个基团R 1，R 2和R 3中的至少一个，和（3）至少一个基团R 6与式（III）中的H不同。