Abstract:
A washing system for cleaning within a washing zone comprising at least one inlet capable of fluid communication with a feed water; at least one treatment zone in fluid communication with the at least one inlet, said at least one treatment zone comprising a water softening zone, an electrolysis zone, a dosing zone and combinations thereof; and at least one outlet in fluid communication the at least treatment zone capable of being in fluid communication with a washing zone.
Abstract:
A washing system for use in cleaning or washing a soiled substrate or substrates, the system comprising: a. a washing zone for contacting and washing the soiled substrate with wash liquor; b. a feed supply for providing hot or cold feed water to the washing zone; c. a wash liquor cleanup and recycle zone in fluid communication with the washing zone d. an effluent storage and/or discharge zone; and optionally one or more of e. a product dispensing zone; f. means for sonically or ultrasonically treating the soiled substrate in the washing zone or in a washing pre-treatment zone; g. an electrolysis zone for electrolysing the feed water or wash liquor; h. a wash liquor disinfection zone; and i. a feed water softening zone; The wash liquor cleanup and recycle zone preferably comprises an ultrafiltration or microfiltration device having a cut-off in the range from about 1000 Daltons to about 1 μm, preferably from about 0.05 μm to about 0.5 μm, a lumen size of from about 1 to about 10 mm, preferably from about 2 to about 6 mm, more preferably from about 3 to about 5 mm, and a clean water flux of at least about 1000 L/m2.h.100 kp (RO water at 25° C.), preferably at least about 10,000 L/m2.h.100 kp.
Abstract:
A method for cleaning within a washing zone comprising: placing at least one article for treatment in the washing zone, providing of at least partially deionized water into the washing zone, and optionally providing cleaning composition into the washing zone wherein the combination of said optional cleaning composition and partial deionized water have a specific conductance of less than about 200 μS/cm.
Abstract:
A composition for cleaning with a washing system comprising from about 15% to about 75% of at least one surfactant; from about 0.01% to about 10% of at least one enzyme; less than about 1% builder, and less than about 1% chelant.
Abstract:
A washing system for use in cleaning or washing a substrate comprising: a washing zone capable of containing a substrate; and a water-softening zone.