公开(公告)号：US08500382B2

公开(公告)日：2013-08-06

申请号：US11752118

申请日：2007-05-22

Applicant: James S. Castantini ,  Tent-Chao D. Tao ,  Erin M. Madden ,  Donald N. Polner

Inventor： James S. Castantini ,  Tent-Chao D. Tao ,  Erin M. Madden ,  Donald N. Polner

IPC: H01L21/677

CPC classification number: F24F3/1607 ,  H01L21/67017 ,  H01L21/67213

Abstract: An airflow management system and/or method used in particle abatement in semiconductor manufacturing equipment. In particular, the apparatus disclosed is capable of creating and managing a carefully controlled particle free environment for the handling of semiconductor wafers or similar articles. The apparatus is particularly suited to be used as an interface between an equipment front end module (EFEM) and a vacuum loadlock chamber or other such article of process equipment. The apparatus also enables relative motion between enclosures while maintaining a particle free environment utilizing a moving air diffuser mounted to an interface panel.

Abstract translation: 用于半导体制造设备中的颗粒减少的气流管理系统和/或方法。 特别地，所公开的装置能够创建和管理用于处理半导体晶片或类似物品的精心控制的无颗粒环境。 该装置特别适合用作设备前端模块（EFEM）和真空负载锁定室或其它此类工艺设备之间的界面。 该装置还使得能够在安装到接口面板的移动空气扩散器的同时保持无颗粒环境的情况下在机壳之间进行相对运动。

公开(公告)号：US20080292432A1

公开(公告)日：2008-11-27

申请号：US11752118

申请日：2007-05-22

Applicant: James S. Castantini ,  Tent-Chao D. Tao ,  Erin M. Madden ,  Donald N. Polner

Inventor： James S. Castantini ,  Tent-Chao D. Tao ,  Erin M. Madden ,  Donald N. Polner

IPC: H01L21/677 ,  B65G49/07 ,  F24F13/00

CPC classification number: F24F3/1607 ,  H01L21/67017 ,  H01L21/67213

Abstract: An airflow management system and/or method used in particle abatement in semiconductor manufacturing equipment. In particular, the apparatus disclosed is capable of creating and managing a carefully controlled particle free environment for the handling of semiconductor wafers or similar articles. The apparatus is particularly suited to be used as an interface between an equipment front end module (EFEM) and a vacuum loadlock chamber or other such article of process equipment. The apparatus also enables relative motion between enclosures while maintaining a particle free environment utilizing a moving air diffuser mounted to an interface panel.

Abstract translation: 用于半导体制造设备中的颗粒减少的气流管理系统和/或方法。 特别地，所公开的装置能够创建和管理用于处理半导体晶片或类似物品的精心控制的无颗粒环境。 该装置特别适合用作设备前端模块（EFEM）和真空负载锁定室或其它此类工艺设备之间的接口。 该装置还使得能够在安装到接口面板的移动空气扩散器的同时保持无颗粒环境的情况下在机壳之间进行相对运动。