公开(公告)号：US20070144555A1

公开(公告)日：2007-06-28

申请号：US11519899

申请日：2006-09-13

申请人： Cheng-Chun Chen ,  Shing Chen ,  Chuan-Hui Liu ,  Jia-Ming Huang

发明人： Cheng-Chun Chen ,  Shing Chen ,  Chuan-Hui Liu ,  Jia-Ming Huang

IPC分类号： B08B3/12 ,  B08B3/00 ,  B08B6/00

CPC分类号： H01L21/67051 ,  B08B7/0021 ,  H01L21/02101

摘要： A supercritical CO2 cleaning system is provided, comprising: a closed high-pressure cleaning trough, which is a funnel-shaped vessel tapered from top to bottom; a bearer platform, located within the closed high-pressure cleaning trough and rotated with respect to an object to be cleaned and used for bearing the object to be cleaned; and a movable nozzle set, disposed within the closed high-pressure cleaning trough and above the bearer platform, wherein the object to be cleaned can be cleaned via the movable nozzle set and impurity pollutants will be easily deposited at the bottom of the closed high-pressure cleaning trough after cleaning. A supercritical CO2 cleaning method is also provided, comprising: providing a wafer or an object to be cleaned within a closed high-pressure cleaning trough; introducing liquid CO2 into the closed high-pressure cleaning trough; adding co-solvents and surfactants into the cleaning trough; activating a movable nozzle set in order to increase the cleaning performance; rotating the wafer or the object to be cleaned to remove the impurity pollutants; and lowering the pressure to discharge the CO2 and the impurity pollutants in order to clean the wafer or the object to be cleaned.

摘要翻译： 提供了一种超临界CO 2清洗系统，包括：封闭的高压清洗槽，其是从顶部到底部渐缩的漏斗形容器; 承载平台，位于封闭的高压清洗槽内并相对于待清洁物体旋转并用于承载待清洁物体; 以及可移动的喷嘴组，设置在封闭的高压清洗槽内并在承载平台的上方，其中待清洁的物体可以经由可移动的喷嘴组进行清洁，杂质污染物将容易地沉积在封闭的高压清洗槽的底部， 压力清洗槽清洗后。 还提供了一种超临界CO 2清洗方法，包括：在封闭的高压清洗槽内提供待清洗的晶片或物体; 将液体CO 2引入封闭的高压清洗槽中; 在清洗槽中加入助溶剂和表面活性剂; 激活可移动喷嘴组以增加清洁性能; 旋转晶片或待清洁物体以除去杂质污染物; 并降低压力以排出CO 2和杂质污染物，以便清洁晶片或被清洁物体。