公开(公告)号：US20090271357A1

公开(公告)日：2009-10-29

申请号：US12145908

申请日：2008-06-25

Applicant: Ravi AGARWAL ,  Barath SUNDARAM ,  Aparba EKAMBARAM

Inventor： Ravi AGARWAL ,  Barath SUNDARAM ,  Aparba EKAMBARAM

IPC: G06N5/02

CPC classification number: G06N5/02 ,  G06F17/00

Abstract: A knowledge tracking and analysis system and method. The method may include: an artifact evaluator that receives various use parameters for each knowledge artifact, operates on the received use parameters, and generates respective parameter scores; and a knowledge index calculator that compiles parameter scores and generates a knowledge index indicative of use of the knowledge entities during the project. The system and method allow analysis and tracking of knowledge artifacts in future projects.

Abstract translation: 知识跟踪与分析系统与方法。 该方法可以包括：接收每个知识伪像的各种使用参数的伪影评估器，对所接收的使用参数进行操作，并产生相应的参数得分; 以及知识指数计算器，其编制参数分数并产生指示在项目期间使用知识实体的知识指数。 该系统和方法允许在未来项目中分析和跟踪知识工件。