Electrode
    73.
    发明授权

    公开(公告)号:US473393A

    公开(公告)日:1892-04-19

    申请号:US473393D

    CPC classification number: H01J19/28

    INTEGRATED GAS DISCHARGE TUBE AND PREPARATION METHOD THEREFOR
    75.
    发明申请
    INTEGRATED GAS DISCHARGE TUBE AND PREPARATION METHOD THEREFOR 有权
    一体化排气管及其制备方法

    公开(公告)号:US20160049276A1

    公开(公告)日:2016-02-18

    申请号:US14779082

    申请日:2014-02-13

    Inventor: Meng Fu

    Abstract: Provided is an integrated gas discharge tube. In the integrated gas discharge tube, the structure of the gas discharge tube is regulated into an upper cover and an insulative base, and the internal side surface and the external side surface of the bottom surface of the insulative base are respectively subject to electrode integration, so that the discharge effect of the gas discharge tube is effectively increased and the preparation process and the preparation flow of a multi-terminal-to-ground gas discharge tube are greatly simplified so as to greatly simplify the preparation process and to realize batch production and high integration of the gas discharge tube. Also provided is a preparation method for an integrated gas discharge tube.

    Abstract translation: 提供了一种集成的气体放电管。 在集成气体放电管中,气体放电管的结构被调节到上盖和绝缘基底中,并且绝缘基底的底表面的内侧表面和外侧表面分别进行电极整合, 从而大大简化了气体放电管的放电效果,大大简化了多端对地气体放电管的制备过程和制备流程,大大简化了制备过程,实现了批量生产和 气体放电管的高集成度。 还提供了一种集成气体放电管的制备方法。

    SEMICONDUCTOR DEVICE AND RELATED MANUFACTURING METHOD
    76.
    发明申请
    SEMICONDUCTOR DEVICE AND RELATED MANUFACTURING METHOD 有权
    半导体器件及相关制造方法

    公开(公告)号:US20150279607A1

    公开(公告)日:2015-10-01

    申请号:US14558050

    申请日:2014-12-02

    Inventor: Deyuan XIAO

    Abstract: A semiconductor device may include the following elements: a semiconductor substrate, an insulator positioned on the substrate, a source electrode positioned on the insulator, a drain electrode positioned on the insulator, a gate electrode positioned between the source electrode and the drain electrode, a hallow channel surrounded by the gate electrode and positioned between the source electrode and the drain electrode, a dielectric member positioned between the hollow channel and the gate electrode, a first insulating member positioned between the gate electrode and the source electrode, and a second insulating member positioned between the gate electrode and the drain electrode.

    Abstract translation: 半导体器件可以包括以下元件:半导体衬底,位于衬底上的绝缘体,位于绝缘体上的源电极,位于绝缘体上的漏电极,位于源电极和漏电极之间的栅电极, 由栅极电极包围并定位在源极和漏电极之间的中间通道,位于中空通道和栅电极之间的电介质构件,位于栅电极和源电极之间的第一绝缘构件和第二绝缘构件 位于栅电极和漏电极之间。

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