PARTICLE-BEAM APPARATUS WITH IMPROVED WIEN-TYPE FILTER
    61.
    发明申请
    PARTICLE-BEAM APPARATUS WITH IMPROVED WIEN-TYPE FILTER 有权
    具有改进的WIEN型过滤器的颗粒光束装置

    公开(公告)号:US20080149846A1

    公开(公告)日:2008-06-26

    申请号:US11951543

    申请日:2007-12-06

    Abstract: In a particle-beam apparatus for irradiating a target, a pattern defined in a pattern definer is projected onto the target through a projection system by a beam of energetic electrically charged particles of, largely, a species of a nominal mass having a nominal kinetic energy. To generate the beam, a particle source, a velocity-dependent deflector and an illumination optics system are provided. The velocity-dependent deflector includes a transversal dipole electrical field and/or a transversal dipole magnetic field, which act upon the particles so as to causing a deviation of the path of the particles with regard to the paths of the nominal species which is dependent on the velocity of the particles. A delimiter is provided as a component of the pattern definer or, preferably, the projection system, serving to remove particles whose paths are deviating from the nominal path.

    Abstract translation: 在用于照射目标物的粒子束装置中,以图案定义器定义的图案通过投影系统通过能量带电的粒子束投射到目标物上,该光束的大部分具有标称质量的物质具有标称动能 。 为了产生光束,提供了粒子源,速度依赖偏转器和照明光学系统。 与速度相关的偏转器包括横向偶极电场和/或横向偶极子磁场,其作用于颗粒,从而导致颗粒相对于标称物质的路径的偏离,这取决于 颗粒的速度。 分隔符被提供为图案定义器的一个部件,或者优选地,该投影系统用于去除其路径偏离标称路径的颗粒。

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