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公开(公告)号：US2359453A
公开(公告)日：1944-10-03
申请号：US39947541
申请日：1941-06-24
CPC分类号： B21B23/00 , B21B1/463 , B21B2015/0028 , B21C9/00
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公开(公告)号：US2267564A
公开(公告)日：1941-12-23
申请号：US29783039
申请日：1939-10-04
申请人： VAUGHN MACHINERY CO
发明人： MCILVRIED EDWIN J
IPC分类号： B21C9/00
CPC分类号： B21C9/00
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公开(公告)号：US2223037A
公开(公告)日：1940-11-26
申请号：US25022439
申请日：1939-01-10
申请人： IHRIG HARRY K
发明人： IHRIG HARRY K
IPC分类号： B21C9/00 , B21C9/02 , B21C37/04 , B21J3/00 , C10M169/00
CPC分类号： B21C9/02 , B21C9/00 , C10M7/00 , C10M2201/062 , C10M2205/18 , C10M2209/00 , C10M2209/02 , C10M2209/10 , C10M2209/12 , C10N2240/402 , C10N2240/403 , C10N2240/404 , C10N2240/405 , C10N2240/406 , C10N2240/407 , C10N2240/408 , C10N2240/409 , C10N2250/08 , C10N2250/10
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公开(公告)号：US20220152676A1
公开(公告)日：2022-05-19
申请号：US17439042
申请日：2020-03-18
发明人： Chandra Sekhar Meduri , Zhonglue Hu , Golden Kumar , Jerzy Blawzdziewicz , Harvinder Singh Gill
摘要： Embossing of metallic glass supercooled liquids into templates is emerging as a precision net-shaping and surface patterning technique for metals. Here, the effect of thickness of metallic glass on template-based embossing is disclosed. The results show that the existing embossing theory developed for thick samples fails to describe the process when the thickness of metallic glass becomes comparable to the template cavity diameter. Increased flow resistance at the cavity entrance results in viscous buckling of supercooled liquid instead of filling. A new phenomenological equation is proposed to describe the thickness dependent filling of template cavities. The buckling phenomenon is analyzed based on the folding model of multilayer viscous media. Controlled buckling can be harnessed in fabrication of metal microtubes, which are desirable for many emerging applications.
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公开(公告)号：US20220134377A1
公开(公告)日：2022-05-05
申请号：US17574616
申请日：2022-01-13
IPC分类号： B05C3/15 , B29C48/154 , B05D1/18 , H01B13/32 , B05D7/20 , H01B13/16 , B21C3/06 , B21C9/00 , B29C48/25 , B29C48/06 , B21C3/14 , B29C70/50 , B29C48/34 , B29C48/325 , B29C48/30
摘要： An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.
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公开(公告)号：US11298719B2
公开(公告)日：2022-04-12
申请号：US16182030
申请日：2018-11-06
IPC分类号： B05D1/18 , B05C3/15 , H01B13/32 , B21C3/06 , B29C48/154 , B05D7/20 , H01B13/16 , B21C3/14 , B21C9/00 , B29C70/50 , B29C48/25 , B29C48/30 , B29C48/325 , B29C48/06 , B29C48/34
摘要： An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.
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公开(公告)号：US20210252573A1
公开(公告)日：2021-08-19
申请号：US16793303
申请日：2020-02-18
发明人： CHUNG-MING YU , SHI-WEI WANG , SHIH-HAO WANG
摘要： A wire drawing process of a light storage wire includes a feeding step, a mixing step, a first drying step, a hot melt extrusion step, a first cooling step, a shaping/organizing wire step, a hot-temperature remodeling step, a stretching step, a second cooling step, a strand winding/rolling step, and a second drying step.
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公开(公告)号：US11033923B2
公开(公告)日：2021-06-15
申请号：US16099067
申请日：2017-05-08
发明人： Juan Alberto Galindo Gonzalez , Richard Yorde , Rick Anderson , Jess A. McGilvery , Washington I. McGilvery , Douglas Michael , Randy D. Kummer
IPC分类号： B05C3/15 , H01B13/32 , B21C3/06 , B29C48/154 , B05D7/20 , B05D1/18 , H01B13/16 , B21C3/14 , B21C9/00 , B29C70/50 , B29C48/25 , B29C48/30 , B29C48/325 , B29C48/06 , B29C48/34
摘要： Provided are apparatuses for the processing of one or more components of a fluid into the surface of a linear substrate. The apparatuses include a processing barrel having a chamber defined therein as well as a linear substrate inlet and a linear substrate outlet. The processing barrel also includes a fluid inlet and a fluid outlet in fluid communication with the chamber. An exposure gap is defined between the linear substrate inlet and the linear substrate outlet. The chamber is dimensionally reconfigurable so that the exposure gap can have a length from zero to greater than zero.
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公开(公告)号：US20200181747A1
公开(公告)日：2020-06-11
申请号：US16211999
申请日：2018-12-06
发明人： Chia-Hao HSU , Shun-Yu SHAO
摘要： A continuous wire drawing apparatus includes: a wire releasing scrollbar and a wire collecting scrollbar being respectively a wire releasing end and a wire collecting end of a metal wire material; a wire drawing force control unit and a back force control unit providing a drawing force and a back force to the wire collecting end and the wire releasing end respectively; a heating unit disposed between the wire releasing end and the wire collecting end, and adapted to heat the metal wire material continuously at a heating temperature in a heating area, whereby the metal wire material is deformed by a strength difference between the drawing force and the back force; and a cooling unit disposed between the heating unit and the wire collecting end, and adapted to cool the metal wire material continuously at a cooling temperature in a cooling area.
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