公开(公告)号：US06372392B1

公开(公告)日：2002-04-16

申请号：US09758553

申请日：1997-11-06

Applicant: Eiichi Hoshino ,  Masanori Onodera ,  Naoyuki Ishiwata ,  Kazumasa Doi ,  Mitsufumi Naoe

Inventor： Eiichi Hoshino ,  Masanori Onodera ,  Naoyuki Ishiwata ,  Kazumasa Doi ,  Mitsufumi Naoe

IPC: G03F900

CPC classification number: C03C17/3618 ,  C03C17/06 ,  C03C17/36 ,  C03C17/3665 ,  C03C23/006 ,  C03C2217/26 ,  C03C2217/425 ,  C03C2218/33 ,  G03F1/30 ,  G03F1/34

Abstract: A transparent optical device is provided with a transparent medium having a front side, at least a portion of the front side being adapted for receiving light. A porous layer is formed on substantially all areas of the front side which are adapted for receiving light. The transparent optical device may have a recessed surface area which is recessed below a remainder area of the front side to define a phase shift photomask. The transparent medium may be made of synthesized silica. The porous layer may be formed by reactive ion etching using gaseous plasma of halogenized hydrocarbon. The front side of the transparent medium may have a portion not adapted for receiving light which may have a metal pattern formed thereon. In producing the transparent optical mask, the porous layer may be formed before or after the metal pattern. The transparent optical device may be formed in an etching chamber in which etching depth is monitored by measuring the transmissivity of a preselected portion of the transparent medium.

Abstract translation: 透明光学装置设置有具有前侧的透明介质，前侧的至少一部分适于接收光。 多孔层形成在前侧的基本上所有适于接收光的区域上。 透明光学器件可以具有凹入的表面区域，该凹陷表面区域在正面的剩余区域下方凹入以限定相移光掩模。 透明介质可以由合成二氧化硅制成。 多孔层可以通过使用卤化烃的气体等离子体的反应离子蚀刻形成。 透明介质的前侧可以具有不适于接收可能形成有金属图案的光的部分。 在制造透明光学掩模时，多孔层可以在金属图案之前或之后形成。 透明光学器件可以形成在蚀刻室中，其中通过测量透明介质的预选部分的透射率来监测蚀刻深度。