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公开(公告)号：US20220336541A1
公开(公告)日：2022-10-20
申请号：US17417709
申请日：2020-09-30
Inventor： Tong NIU , Ming HU , Chang LUO , Jianpeng WU , Benlian WANG , Fengli JI , Peng XU , Qian XU , Guomeng ZHANG , Yan HUANG
IPC: H01L27/32
Abstract: Display substrate, display device, high-precision metal mask are provided. Display substrate includes: first, second, and third sub-pixels; in first direction, first and third sub-pixels are alternately arranged to form first sub-pixel rows, second sub-pixels form second sub-pixel rows; in second direction, first and second sub-pixel rows are alternately arranged; two first and two third sub-pixels in two adjacent rows and two adjacent columns form 2*2 array; in the array, two first sub-pixels are in different rows and in different columns, so are the two third sub-pixels, connection lines of centers of two first and two third sub-pixels form virtual quadrilateral, second sub-pixel is within virtual quadrilateral; for multiple distances from centers of two first and two third sub-pixels corresponding to same virtual quadrilateral to center of second sub-pixel, at least two distances are different. Brightness centers of virtual pixels have more uniform distribution.
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公开(公告)号：US20220180807A1
公开(公告)日：2022-06-09
申请号：US17599057
申请日：2021-02-18
Inventor： Peng XU , Jianbo YE , Ju MEI , Zhenzhen WANG , Guoqiang MA
IPC: G09G3/3208 , G06V40/16
Abstract: The present disclosure provides a display panel having a display area and including: a plurality of infrared emitting units and a plurality of infrared receiving units in the display area. The plurality of infrared emitting units are configured to emit infrared light to outside of the display panel, and the plurality of infrared receiving units are configured to receive the infrared light reflected by an object outside the display panel and output an electrical signal according to the received infrared light.
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Patent Agency Ranking
公开(公告)号：US20210036085A1
公开(公告)日：2021-02-04
申请号：US16766613
申请日：2019-05-23
Inventor： Hongwei HU , Yanxia XIN , Xueping LI , Zheng BAO , Yihao WU , Peng XU , Donghong LIU
Abstract: An OLED display substrate, a display panel, a display device, a manufacturing method and a fingerprint identification module are provided. The OLED display substrate includes a microporous light-shielding pattern arranged between adjacent pixel regions and including a plurality of pinholes. The microporous light-shielding pattern is arranged at a same layer as, and insulated from, a nontransparent electrode of the OLED display substrate.
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54.发明申请公开(公告)号：US20200340103A9
公开(公告)日：2020-10-29
申请号：US15779231
申请日：2017-10-13
Inventor： Peng XU , Shengkai PAN , Yongkang QIAO , Jie LIU
Abstract: The present disclosure relates to a deposition prevention plate and a method for manufacturing the same, a method for recycling materials, and a thin film deposition apparatus. The deposition prevention plate includes a substrate, and a carrier layer on the substrate for carrying a plating material, wherein the carrier layer can be peeled off from the substrate. By forming a peelable carrier layer on the substrate, the cleaning process of the deposition prevention plate can be simplified, thereby saving the cleaning cost of the deposition prevention plate. In addition, by recycling and reusing the plating material in a method such as distillation, filtration or physical separation, the utilization of the plating material can be further improved.
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公开(公告)号：US20180135163A9
公开(公告)日：2018-05-17
申请号：US15511577
申请日：2016-03-25
Inventor： Gu YAO , Suwei ZENG , Peng XU
CPC classification number: C23C14/243 , C23C14/24 , C23C14/544 , C23C14/546
Abstract: The present disclosure relates to the field of display technology, particularly to a vacuum deposition apparatus and a vapor deposition method. The vacuum deposition apparatus includes a vacuum chamber and a rotary base, an evaporation source, and a plurality of vapor deposition zones arranged in series from bottom to top in the vacuum chamber, wherein the shape of the rotary base is a Reuleaux triangle, and the trajectories of movement of its vertices in the horizontal plane is a rounded square, the vapor deposition zones are arranged at intervals along the trajectories of movement of the vertices of the rotary base, the evaporation source is driven by the rotary base to pass below the vapor deposition zones sequentially, so that the evaporation source can be used to perform the vapor deposition operation in multiple directions simultaneously, thus improving the uniformity of film formation and utilization of the evaporation material.
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公开(公告)号：US20170283938A1
公开(公告)日：2017-10-05
申请号：US15511577
申请日：2016-03-25
Inventor： Gu YAO , Suwei ZENG , Peng XU
CPC classification number: C23C14/243 , C23C14/24 , C23C14/544 , C23C14/546
Abstract: The present disclosure relates to the field of display technology, particularly to a vacuum deposition apparatus and a vapor deposition method. The vacuum deposition apparatus includes a vacuum chamber and a rotary base, an evaporation source, and a plurality of vapor deposition zones arranged in series from bottom to top in the vacuum chamber, wherein the shape of the rotary base is a Reuleaux triangle, and the trajectories of movement of its vertices in the horizontal plane is a rounded square, the vapor deposition zones are arranged at intervals along the trajectories of movement of the vertices of the rotary base, the evaporation source is driven by the rotary base to pass below the vapor deposition zones sequentially, so that the evaporation source can be used to perform the vapor deposition operation in multiple directions simultaneously, thus improving the uniformity of film formation and utilization of the evaporation material.
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57.发明申请Airflow Control Device and Method of Adjusting the Same, Substrate Cleaning Device 审中-公开气流控制装置及其调整方法，基板清洗装置公开(公告)号：US20160300737A1
公开(公告)日：2016-10-13
申请号：US15083470
申请日：2016-03-29
Inventor： Peng XU , Yong WANG , Yongkang QIAO , Gu YAO
IPC: H01L21/67 , H01L21/677
CPC classification number: H01L21/67051 , H01L21/67017 , H01L21/6719 , H01L21/67288 , H01L21/67706 , H01L21/6776
Abstract: The present invention discloses an airflow control device and a method of adjusting the same, a substrate cleaning device. The airflow control device is provided in a cleaning chamber for cleaning a substrate, and includes a first cover, a second cover, a third cover and a fourth cover. The first cover and the third cover are provided face to face in the upper portion of the cleaning chamber, the second cover and the fourth cover are provided face to face in the lower portion of the cleaning chamber. The four covers form an airflow control space which accommodates a cleaning solution outlet. The space is used for keeping the strong airflow within the area under the outlet, such that shaking and deformation of the substrate due to the strong airflow are reduced to improve the efficiency of cleaning, and reduce the risk of fragmentation, and further lower the production cost.
Abstract translation: 本发明公开了一种气流控制装置及其调节方法，即基板清洗装置。 气流控制装置设置在用于清洁基板的清洁室中，并且包括第一盖，第二盖，第三盖和第四盖。 第一盖和第三盖在清洁室的上部面对面地设置，第二盖和第四盖在清洁室的下部面对地设置。 四个盖形成一个适应清洁溶液出口的气流控制空间。 该空间用于将强气流保持在出口下方的区域内，从而降低由于强气流引起的基板振动和变形，提高清洗效率，降低碎裂风险，进一步降低生产成本 成本。
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