公开(公告)号：US07292408B2

公开(公告)日：2007-11-06

申请号：US10903341

申请日：2004-07-30

申请人： Andrew Chiu ,  Edward Hin Pong Lee ,  John Jaekoyun Yang ,  Michael Ming Hsiang Yang ,  Sue Siyang Zhang

发明人： Andrew Chiu ,  Edward Hin Pong Lee ,  John Jaekoyun Yang ,  Michael Ming Hsiang Yang ,  Sue Siyang Zhang

IPC分类号： G11B5/17

CPC分类号： G11B5/3163 ,  G11B5/17 ,  G11B5/1871

摘要： A magnetic write head for use in a data recording system having first and second magnetic pole, the first pole having a P1 pedestal. An electrically conductive coil passes through a space between the first and second poles for inducing a magnetic flux through the yoke formed by the first and second poles. A bi-layer insulation layer disposed between the poles includes a layer of photoresist for preventing voids and a layer of alumina formed thereover to provide a structural brace to prevent recession of the P1 pedestal during manufacturing operations such as soda blast.

摘要翻译： 一种用于具有第一和第二磁极的数据记录系统的磁性写头，所述第一极具有P1基座。 导电线圈通过第一和第二极之间的空间，用于引导通过由第一和第二极形成的轭的磁通。 设置在极之间的双层绝缘层包括用于防止空隙的光致抗蚀剂层和形成在其上的氧化铝层，以提供结构支架，以防止诸如苏打爆炸的制造操作期间P1基座的凹陷。

公开(公告)号：US08066892B2

公开(公告)日：2011-11-29

申请号：US12241751

申请日：2008-09-30

申请人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： B44C1/22

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315

摘要： A method for manufacturing a write pole for a perpendicular magnetic write head. The method employs a damascene process to construct the write pole with a very accurately controlled track width. The method includes depositing a layer of material that can be readily removed by reactive ion etching. This material can be referred to as a RIEable material. A mask is formed over the RIEable material and a reactive ion etching is performed to form a tapered trench in the RIEAble material. A CMP stop layer can the be deposited, and a write pole plated into the trench. A CMP can then be performed to define the trailing edge of the write pole. Another masking, etching and plating step can be performed to form a trailing, wrap-around magnetic shield.

摘要翻译： 一种用于制造用于垂直磁写头的写极的方法。 该方法采用镶嵌工艺构造具有非常精确控制的轨道宽度的写极点。 该方法包括沉积可以通过反应离子蚀刻容易地去除的材料层。 该材料可以称为可分级材料。 在RIEable材料上形成掩模，并执行反应离子蚀刻以在RIEAble材料中形成锥形沟槽。 可以将CMP停止层沉积，并将写入极电镀到沟槽中。 然后可以执行CMP以限定写入极的后沿。 可以执行另一掩模，蚀刻和电镀步骤以形成拖尾的环绕磁屏蔽。

公开(公告)号：US07788798B2

公开(公告)日：2010-09-07

申请号：US11944125

申请日：2007-11-21

申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi ,  Sue Siyang Zhang

发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi ,  Sue Siyang Zhang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49798

摘要： A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.

摘要翻译： 一种用于制造具有围绕磁屏蔽的磁性写入头的方法。 该方法允许使用高精度的短波长（例如193mm光刻）来精确地定义磁屏蔽环绕的放置和临界尺寸。 该方法包括形成磁性写入极，顶部间隙和侧面间隙以及在其上沉积RIEable填充层，并将CMP平坦化。 使用193nm光刻和离子研磨在RIEable层上形成掩模，并且执行一个或多个反应离子蚀刻工艺以通过193nm光刻掩模对RIEable层进行图案化。 然后可以将环绕的护罩电镀到形成在RIEable层中的开口中。

公开(公告)号：US20100078406A1

公开(公告)日：2010-04-01

申请号：US12241751

申请日：2008-09-30

申请人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： B44C1/22

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315

摘要： A method for manufacturing a write pole for a perpendicular magnetic write head. The method employs a damascene process to construct the write pole with a very accurately controlled track width. The method includes depositing a layer of material that can be readily removed by reactive ion etching. This material can be referred to as a RIEable material. A mask is formed over the RIEable material and a reactive ion etching is performed to form a tapered trench in the RIEAble material. A CMP stop layer can the be deposited, and a write pole plated into the trench. A CMP can then be performed to define the trailing edge of the write pole. Another masking, etching and plating step can be performed to form a trailing, wrap-around magnetic shield.

摘要翻译： 一种用于制造用于垂直磁写头的写极的方法。 该方法采用镶嵌工艺构造具有非常精确控制的轨道宽度的写极点。 该方法包括沉积可以通过反应离子蚀刻容易地去除的材料层。 该材料可以称为可分级材料。 在RIEable材料上形成掩模，并执行反应离子蚀刻以在RIEAble材料中形成锥形沟槽。 可以将CMP停止层沉积，并将写入极电镀到沟槽中。 然后可以执行CMP以限定写入极的后沿。 可以执行另一掩模，蚀刻和电镀步骤以形成拖尾的环绕磁屏蔽。

公开(公告)号：US07397634B2

公开(公告)日：2008-07-08

申请号：US10602462

申请日：2003-06-23

申请人： Daniel Wayne Bedell ,  Richard Hsiao ,  James D. Jarratt ,  Patrick Rush Webb ,  Sue Siyang Zhang

发明人： Daniel Wayne Bedell ,  Richard Hsiao ,  James D. Jarratt ,  Patrick Rush Webb ,  Sue Siyang Zhang

IPC分类号： G11B5/17

CPC分类号： G11B5/313 ,  G11B5/3123 ,  G11B5/3163 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/4906 ,  Y10T29/49064 ,  Y10T29/49073

摘要： A system and method are provided for manufacturing a coil structure for a magnetic head. Initially, an insulating layer is deposited with a photoresist layer deposited on the insulating layer. Moreover, a silicon dielectric layer is deposited on the photoresist layer as a hard mask. The silicon dielectric layer is then masked. A plurality of channels is subsequently formed in the silicon dielectric layer using reactive ion etching (i.e. CF4/CHF3). The silicon dielectric layer is then used as a hard mask to transfer the channel pattern in the photoresist layer using reactive ion etching with, for example, H2/N2/CH3F/C2H4 reducing chemistry. To obtain an optimal channel profile with the desired high aspect ratio, channel formation includes a first segment defining a first angle and a second segment defining a second angle. Thereafter, a conductive seed layer is deposited in the channels and the channels are filled with a conductive material to define a coil structure. Chemical-mechanical polishing may then be used to planarize the conductive material.

公开(公告)号：US07396768B2

公开(公告)日：2008-07-08

申请号：US11584027

申请日：2006-10-20

申请人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： H01L21/302

CPC分类号： C23F3/06 ,  C09G1/02 ,  C23F3/04 ,  C25D5/02 ,  G11B5/3163 ,  G11B5/3169

摘要： In one method and embodiment of the present invention, at least one coil layer is formed in a write head, using a two-slurry step of copper damascene chemical mechanical polishing method with a first slurry step removing the undesirable copper that is on top of the tantalum barrier layer and on top of the trenches and a second slurry step removing the remainder of the undesirable copper, the tantalum barrier layer, the silicon dioxide hard mask layer, the hard baked photoresist layer, the magnetic alloy such as NiFe, CoFe, or CoNiFe, and alumina insulating layer for better thin film magnetic head performances.

公开(公告)号：US20080096389A1

公开(公告)日：2008-04-24

申请号：US11584027

申请日：2006-10-20

申请人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： H01L21/461 ,  H01L21/302 ,  C23F1/00

CPC分类号： C23F3/06 ,  C09G1/02 ,  C23F3/04 ,  C25D5/02 ,  G11B5/3163 ,  G11B5/3169

摘要： In one method and embodiment of the present invention, at least one coil layer is formed in a write head, using a two-slurry step of copper damascene chemical mechanical polishing method with a first slurry step removing the undesirable copper that is on top of the tantalum barrier layer and on top of the trenches and a second slurry step removing the remainder of the undesirable copper, the tantalum barrier layer, the silicon dioxide hard mask layer, the hard baked photoresist layer, the magnetic alloy such as NiFe, CoFe, or CoNiFe, and alumina insulating layer for better thin film magnetic head performances.

摘要翻译： 在本发明的一个方法和实施例中，使用铜镶嵌化学机械抛光方法的双浆步骤，在写头中形成至少一个线圈层，其中第一浆料步骤除去位于 钽阻挡层并且在沟槽的顶部上，第二浆料步骤除去不需要的铜，钽阻挡层，二氧化硅硬掩模层，硬烘焙光致抗蚀剂层，磁性合金如NiFe，CoFe或 CoNiFe和氧化铝绝缘层，用于更好的薄膜磁头性能。

公开(公告)号：US07108796B2

公开(公告)日：2006-09-19

申请号：US10676466

申请日：2003-09-30

申请人： Christopher W. Bergevin ,  James D. Jarratt ,  Jyh-Shuey Jerry Lo ,  Sue Siyang Zhang

发明人： Christopher W. Bergevin ,  James D. Jarratt ,  Jyh-Shuey Jerry Lo ,  Sue Siyang Zhang

IPC分类号： G11B5/127 ,  B44C1/22

CPC分类号： G11B5/187 ,  G11B5/232 ,  G11B5/3116 ,  G11B5/3163 ,  Y10T29/49043 ,  Y10T29/49046

摘要： A method for fabrication of magnetic write heads for disk drives in which a P1 layer is formed having a P1 Protrusion, the P1 Protrusion having a longitudinal reference axis. A gap layer is deposited on the P1 Protrusion and a layer of fill material is deposited on the gap layer. The fill material layer is shaped to form a mold which surrounds a hollow which is aligned with the longitudinal axis of the P1 Protrusion. This hollow in the fill material layer is filled with P2 pole material to form a P2 pole which is then automatically substantially aligned with the longitudinal axis of the P1 Protrusion.

摘要翻译： 一种用于制造磁盘驱动器的写磁头的方法，其中形成具有P 1突起的P 1层，所述P 1突起具有纵向参考轴。 间隙层沉积在P 1突起上，并且填充材料层沉积在间隙层上。 填充材料层被成形为形成围绕与P 1突起的纵向轴线对准的中空部的模具。 填充材料层中的该中空填充有P 2极材料，以形成P 2极，然后自动基本上与P 1突起的纵向轴线对齐。