公开(公告)号：US20150034008A1

公开(公告)日：2015-02-05

申请号：US14183963

申请日：2014-02-19

Applicant: Samsung Display Co., Ltd.

Inventor： Choel-Min JANG ,  Myung-Soo Huh ,  Suk-Won Jung ,  Sung-Hun Key ,  In-Kyo Kim

IPC: C23C16/52 ,  C23C16/455

CPC classification number: C23C16/52 ,  C23C16/4401 ,  C23C16/45527 ,  C23C16/45551 ,  C23C16/45561

Abstract: Provided is a vapor deposition apparatus including a deposition unit including a plurality of deposition modules disposed parallel to each other and a substrate mounting unit located below the deposition unit, on which a substrate is mounted. In this case, each of the plurality of deposition modules includes a nozzle configured to selectively inject a raw gas and a purge gas toward the substrate mounting unit, and the nozzle injects the raw gas while the substrate mounting unit is being located below the nozzle.

Abstract translation: 本发明提供一种蒸镀装置，其特征在于，包括具有彼此平行配置的多个沉积模块的沉积单元和位于所述沉积单元的下方的基板安装单元，基板安装在所述沉积单元上。 在这种情况下，多个沉积模块中的每一个都包括一个喷嘴，该喷嘴构造成选择性地将原料气体和净化气体朝向基板安装单元喷射，并且喷嘴在基板安装单元位于喷嘴下方时喷射原料气体。

公开(公告)号：US20140322837A1

公开(公告)日：2014-10-30

申请号：US13975259

申请日：2013-08-23

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Tae-Wook Kang

IPC: H01L51/56

CPC classification number: H01L51/56 ,  C23C14/0688 ,  C23C14/08 ,  C23C14/3464 ,  C23C14/352 ,  H01L51/5253

Abstract: A method of forming nanocrystals includes loading a substrate into a chamber, applying a first voltage to a first target to form a thin film including a first metal compound on the substrate by sputtering, and applying a second voltage to a second target and forming nanocrystals in the thin film by sputtering.

Abstract translation: 形成纳米晶体的方法包括将衬底加载到腔室中，向第一靶施加第一电压以通过溅射在衬底上形成包括第一金属化合物的薄膜，以及向第二靶施加第二电压并在第 该薄膜通过溅射。