公开(公告)号：US20130235357A1

公开(公告)日：2013-09-12

申请号：US13790764

申请日：2013-03-08

Applicant: KLA-TENCOR CORPORATION

Inventor： Gildardo Delgado ,  Frank Chilese

IPC: G03F7/20

CPC classification number: G03F7/70908

Abstract: Controlling particles near a reticle of a lithography or reticle inspection system may include generating a curtain of ultraviolet light about a reticle protection area of a reticle by illuminating a region surrounding the reticle protection area with ultraviolet light having sufficient energy to induce a charge on one or more particles traversing the curtain of ultraviolet light, generating an electric field in a region positioned between the generated curtain of ultraviolet light and the reticle protection area, the electric field generated between a first charging element and a second charging element having an opposite charge to the first charging element, directing one or more charged particles to the first charging element or the second charging element using the generated electric field; and capturing the one or more charged particles on the first charging element or the second charging element.

Abstract translation: 在光刻或掩模版检查系统的掩模版附近的控制颗粒可以包括通过用足够的能量的紫外线照射掩模版保护区域周围的区域来在掩模版保护区域附近产生紫外光幕，以在一个或 更多的粒子穿过紫外线的窗帘，在位于所生成的紫外光之间的区域和标线保护区域之间产生电场，在第一充电元件和具有相反电荷的第二充电元件之间产生的电场 第一充电元件，使用所产生的电场将一个或多个带电粒子引导到第一充电元件或第二充电元件; 以及捕获所述第一充电元件或所述第二充电元件上的所述一个或多个带电粒子。