公开(公告)号：US20210381825A1

公开(公告)日：2021-12-09

申请号：US17098835

申请日：2020-11-16

Applicant: KLA Corporation

Inventor： Yoel Feler ,  Mark Ghinovker

IPC: G01B11/27 ,  G06T7/00

Abstract: A metrology target includes a first target structure set having one or more first target structures formed within at least one of a first working zone or a second working zone of a sample. The metrology target includes a second target structure set having one or more second target structures formed within at least one of the first working zone or the second working zone. The first working zone may include a center of symmetry that overlaps with a center of symmetry of the second working zone when an overlay error of one or more layers of the sample is not present. The metrology target may additionally include a third target structure set, a fourth target structure set, or a fifth target structure set.