公开(公告)号：US11170973B2

公开(公告)日：2021-11-09

申请号：US16735125

申请日：2020-01-06

Applicant: Applied Materials, Inc.

Inventor： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, Jr. ,  Benjamin Oswald ,  Craig R. Chaney

IPC: H01J37/302 ,  H01J37/08 ,  H01J37/317

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US10957509B1

公开(公告)日：2021-03-23

申请号：US16676996

申请日：2019-11-07

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Daniel Alvarado ,  Shreyansh P. Patel ,  Daniel R. Tieger

IPC: H01J27/02 ,  H01J27/20 ,  H01J37/34

Abstract: An ion source with an insertable target holder for holding a solid dopant material is disclosed. The insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder has a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. The porous surface may be a portion of a perforated crucible, a portion of a perforated retention cap, or a porous insert.

公开(公告)号：US20190180971A1

公开(公告)日：2019-06-13

申请号：US16190649

申请日：2018-11-14

Applicant: APPLIED Materials, Inc.

Inventor： Klaus Becker ,  Daniel Alvarado ,  Michael St. Peter ,  Graham Wright

IPC: H01J37/08 ,  H01J37/34

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.