公开(公告)号：US07827265B2

公开(公告)日：2010-11-02

申请号：US11726962

申请日：2007-03-23

Applicant: Charlie Cheever ,  Chris Putnam ,  Aditya Agarwal ,  Ezra Callahan ,  Bob Trahan

Inventor： Charlie Cheever ,  Chris Putnam ,  Aditya Agarwal ,  Ezra Callahan ,  Bob Trahan

IPC: G06F15/173

CPC classification number: H04L63/102 ,  G06Q30/02 ,  H04L51/12 ,  H04L63/083

Abstract: A method for confirming a request for an association with an organization by a user of a web-based social network is disclosed. In one embodiment, the request includes an e-mail address not controlled by the organization. The request may also be part of an application for membership with the web-based social network. A determination is made whether the request is accepted based at least partially on a specified number of prior requests for association with the organization or being identified as a member of the organization by another user already a member of the organization. The organization may be a high school, a college, a university, a business, a non-profit company, or any other group of people who may desire to associate with each other.

Abstract translation: 公开了一种用于基于网络的社交网络的用户确认与组织的关联的请求的方法。 在一个实施例中，请求包括不由组织控制的电子邮件地址。 该请求也可以是基于网络的社交网络的成员申请的一部分。 确定是否至少部分地基于指定数量的与组织的关联的先前请求或被组织的另一个用户识别为该组织的成员而被接受的请求是否被接受。 该组织可以是高中，大学，大学，企业，非营利性公司或者可能希望相互联系的任何其他群体。

公开(公告)号：US20100009488A1

公开(公告)日：2010-01-14

申请号：US12499294

申请日：2009-07-08

Applicant: Srinivasan Sivaram ,  Aditya Agarwal ,  S. Brad Herner ,  Christopher J. Petti

Inventor： Srinivasan Sivaram ,  Aditya Agarwal ,  S. Brad Herner ,  Christopher J. Petti

IPC: H01L31/18 ,  H01L21/30

CPC classification number: H01L31/022425 ,  H01L31/0682 ,  H01L31/0747 ,  H01L31/1804 ,  H01L31/1892 ,  Y02E10/547 ,  Y02P70/521

Abstract: A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.

Abstract translation: 通过在诸如半导体晶片的施主体的表面下方注入气体离子形成非常薄的光伏电池。 离子注入限定了解理面，随后的步骤在切割平面处从晶片剥离薄层。 光伏电池，或光伏电池的基极或发射极的全部或一部分形成在层内。 在优选实施例中，在切割步骤之前将晶片固定到接收器。 电接触可以形成在层的两个表面上，或仅形成在一个表面上。

公开(公告)号：US20090283669A1

公开(公告)日：2009-11-19

申请号：US12122108

申请日：2008-05-16

Applicant: Thomas Parrill ,  Aditya Agarwal

Inventor： Thomas Parrill ,  Aditya Agarwal

IPC: H01J49/26 ,  G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/20 ,  H01J2237/2007

Abstract: Ion implanters are especially suited to meet process dose and energy demands associated with fabricating photovoltaic devices by ion implantation followed by cleaving.

Abstract translation: 离子注入机特别适用于通过离子注入和裂解来制造与制造光伏器件相关的工艺剂量和能量需求。

公开(公告)号：US20060057303A1

公开(公告)日：2006-03-16

申请号：US10940263

申请日：2004-09-14

Applicant: Aditya Agarwal ,  Robert Rathmell ,  David Hoglund

Inventor： Aditya Agarwal ,  Robert Rathmell ,  David Hoglund

IPC: C23C14/00 ,  H01J7/24

CPC classification number: H01J37/304 ,  H01J37/3171 ,  H01J2237/30472

Abstract: An ion implanter for creating a ribbon or ribbon-like beam by having a scanning device that produces a side to side scanning of ions emitting by a source to provide a thin beam of ions moving into an implantation chamber. A workpiece support positions a workpiece within the implantation chamber and a drive moves the workpiece support up and down through the thin ribbon beam of ions perpendicular to the plane of the ribbon to achieve controlled beam processing of the workpiece. A control includes a first control output coupled to said scanning device to limit an extent of side to side scanning of the ion beam to less than a maximum amount and thereby limit ion processing of the workpiece to a specified region of the workpiece and a second control output coupled to the drive simultaneously limits an extent of up and down movement of the workpiece to less than a maximum amount and to cause the ion beam to impact a controlled portion of the workpiece.

Abstract translation: 一种离子注入机，用于通过具有扫描装置来产生色带或带状光束，该扫描装置产生由源发射的离子的侧面扫描以提供移动到注入室中的薄的离子束。 工件支撑件将工件定位在注入室内，并且驱动器通过垂直于带平面的离子的薄带离子将工件支撑件上下移动，以实现对工件的受控梁加工。 控制器包括耦合到所述扫描装置的第一控制输出，以将离子束的侧向扫描的范围限制为小于最大量，从而限制工件到工件的指定区域的离子处理和第二控制 耦合到驱动器的输出同时将工件的上下移动范围限制为小于最大量并且使离子束冲击工件的受控部分。