Abstract:
An exhaust system for use with a microwave excited ultraviolet lamp system is provided to receive cooling air emitted from the lamp system and to contain and direct the cooling air so as not to contact a substrate being irradiated with ultraviolet light. A lens, such as a quartz lens, is supported by the exhaust duct to transmit the ultraviolet light emitted from the lamp system toward the substrate.
Abstract:
A reflector (42) for use in a microwave excited ultra-violet lamp system (10) having a plasma lamp bulb (20). The reflector (42) includes a pair of longitudinally extending reflector panels (46) that are mounted in opposing, i.e., mirror facing relationship, and in space relationship to the plasma lamp bulb (20). A longitudinally extending intermediate member (52) is mounted in spaced relationship to the pair of reflector panels (46) and to the plasma lamp bulb (20). The reflector panels (46) and the intermediate member (52) form a pair of longitudinally extending slots (64) that are operable to pass air toward the plasma lamp bulb (20) to envelop the bulb (20) effectively entirely about its outer surface. Alternatively, the pair of reflector panels (46e) are connected to longitudinally extending edges (58e) of the intermediate member (52e). The intermediate member (52e) includes multiple apertures (78) formed therethrough that are operable to pass air toward the bulb (20) to envelope the bulb (20) effectively entirely about its outer surface. A method of cooling a plasma lamp bulb (20) in a microwave excited ultraviolet lamp system (10) is also disclosed.
Abstract:
An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A reflector is mounted within the processing space of the microwave chamber and is capable of reflecting ultraviolet radiation to uniformly irradiate the substrate in a surrounding fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.
Abstract:
A power supply for supplying operating voltages to a magnetron of a lamp heating or curing system. The power supply is mounted remotely from the magnetron and includes a filament transformer for providing a regulated filament current to the magnetron to provide a predetermined filament voltage. Current in the primary of the filament transformer is sensed, and the filament current supplied by the secondary of the filament transformer is controlled by a switching device coupled to the primary of the filament transformer. Methods for supplying regulated filament current to a magnetron are also disclosed.
Abstract:
A method for purging cured and partially cured material from a mixer employed in a system for dispensing two-component reactive polymeric materials, includes, in one aspect, the introduction of a pulsed flow of a flushing material into the mixer to purge partially cured two-component mixture from the mix and thus delay the onset of plugging of the mixer, and, in a second aspect, includes heating the mixer to a temperature between the application temperature and decomposition temperature of the cured components and then introducing flushing material at high hydraulic pressure to discharge cured material from the mixer.