公开(公告)号：US20220236181A1

公开(公告)日：2022-07-28

申请号：US17160547

申请日：2021-01-28

Applicant: KLA Corporation

Inventor： Roie Volkovich ,  Liran Yerushalmi ,  Amnon Manassen ,  Yoram Uziel

IPC: G01N21/41 ,  G01N21/3563

Abstract: A method for optical inspection includes illuminating a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths, measuring spectral properties of the optical radiation reflected from multiple points on the patterned polymer layer over the range of infrared wavelengths, and based on the measured spectral properties, computing a complex refractive index of the patterned polymer layer.

公开(公告)号：US20210364935A1

公开(公告)日：2021-11-25

申请号：US16964734

申请日：2020-06-25

Applicant: KLA CORPORATION

Inventor： Itay Gdor ,  Yuval Lubashevsky ,  Yuri Paskover ,  Yoram Uziel ,  Nadav Gutman

IPC: G03F9/00 ,  G03F7/20

Abstract: A target for use in the measurement of misregistration between layers formed on a wafer in the manufacture of semiconductor devices, the target including a first pair of periodic structures (FPPS) and a second pair of periodic structures (SPPS), each of the FPPS and the SPPS including a first edge, a second edge, a plurality of first periodic structures formed in a first area as part of a first layer and having a first pitch along a first pitch axis, the first pitch axis not being parallel to either of the first edge or second edge, and a plurality of second periodic structures formed in a second area as part of a second layer and having the first pitch along a second pitch axis, the second pitch axis being generally parallel to the first pitch axis.