公开(公告)号：US20150264793A1

公开(公告)日：2015-09-17

申请号：US14724737

申请日：2015-05-28

Applicant: GIGAPHOTON INC.

Inventor： Osamu WAKABAYASHI ,  Tatsuya YANAGIDA ,  Hakaru MIZOGUCHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.

Abstract translation: 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。

公开(公告)号：US20140183379A1

公开(公告)日：2014-07-03

申请号：US14201671

申请日：2014-03-07

Applicant: GIGAPHOTON INC.

Inventor： Tsukasa HORI ,  Kouji KAKIZAKI ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H01S3/02 ,  H01S3/094026 ,  H01S3/10061 ,  H01S3/1106 ,  H01S3/131 ,  H01S3/1636 ,  H01S3/1643 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2383 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20130256567A1

公开(公告)日：2013-10-03

申请号：US13903811

申请日：2013-05-28

Applicant: GIGAPHOTON INC.

Inventor： Kouji KAKIZAKI ,  Shinji NAGAI ,  Tatsuya YANAGIDA

IPC: G21K5/00

CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

Abstract translation: 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。

公开(公告)号：US20130221246A1

公开(公告)日：2013-08-29

申请号：US13679930

申请日：2012-11-16

Applicant: GIGAPHOTON INC.

Inventor： Tsukasa HORI ,  Hideo HOSHINO ,  Tatsuya YANAGIDA

IPC: G21K5/02

CPC classification number: G21K5/02 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply device is provided that may include a pair of rails arranged to face each other, the rails having electrically conductive properties, a target transport mechanism configured to supply a target material into a space between the rails and in contact with the rails, and a power supply connected to the rails and configured to supply a current to the target material through the rails. Methods and systems using the target supply device are also provided.

Abstract translation: 提供目标供应装置，其可以包括一对导轨，其布置成彼此面对，所述导轨具有导电性质;目标传送机构，其配置成将目标材料供应到轨道之间的空间中并与导轨接触;以及 连接到轨道并被配置为通过轨道向目标材料提供电流的电源。 还提供了使用目标供应装置的方法和系统。