公开(公告)号：US20010029006A1

公开(公告)日：2001-10-11

申请号：US09871979

申请日：2001-06-04

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

IPC: F27B001/00

CPC classification number: C03B32/00 ,  C03B20/00 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/20 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2203/50 ,  Y10S501/905

Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of Enull center as measured by means of an electron spin resonance analysis is 3null1019 cmnull3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of Enull center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

公开(公告)号：US3378431A

公开(公告)日：1968-04-16

申请号：US62463567

申请日：1967-03-20

Applicant: PFAUDLER PERMUTIT INC

Inventor： SMITH JR CARLYLE F ,  CRANDALL WILLIAM B

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03C2201/26 ,  C03C2203/10