METHOD OF MANUFACTURING CAPACITOR, METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY DEVICE INCLUDING THE CAPACITOR, AND ORGANIC LIGHT EMITTING DISPLAY DEVICE MANUFACTURED BY USING THE METHOD
    21.
    发明申请
    METHOD OF MANUFACTURING CAPACITOR, METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY DEVICE INCLUDING THE CAPACITOR, AND ORGANIC LIGHT EMITTING DISPLAY DEVICE MANUFACTURED BY USING THE METHOD 审中-公开
    制造电容器的方法,制造包括电容器的有机发光显示装置的方法和使用该方法制造的有机发光显示装置

    公开(公告)号:US20150318338A1

    公开(公告)日:2015-11-05

    申请号:US14794976

    申请日:2015-07-09

    Abstract: A method of manufacturing an organic light emitting display device includes: providing a capacitor on a substrate; providing a protection layer on the capacitor; providing an organic light emitting diode on the protection layer; and providing an encapsulation layer which encapsulates the organic light emitting diode. The providing the capacitor includes: providing a bottom electrode including an oxide semiconductor, on the substrate; providing an insulation layer on the substrate and overlapping the bottom electrode; annealing the bottom electrode to increase a carrier density of the bottom electrode; and providing an intermediate electrode on the insulation layer and overlapping the bottom electrode.

    Abstract translation: 一种制造有机发光显示装置的方法包括:在基板上设置电容器; 在电容器上提供保护层; 在保护层上提供有机发光二极管; 并提供封装有机发光二极管的封装层。 提供电容器包括:在基板上提供包括氧化物半导体的底部电极; 在衬底上提供绝缘层并与底部电极重叠; 对底部电极进行退火以增加底部电极的载流子密度; 并在绝缘层上提供中间电极并与底部电极重叠。

    Method of manufacturing thin-film transistor, method of manufacturing organic light-emitting display device including the same, and thin-film transistor and organic light-emitting display device manufactured using the methods
    22.
    发明授权
    Method of manufacturing thin-film transistor, method of manufacturing organic light-emitting display device including the same, and thin-film transistor and organic light-emitting display device manufactured using the methods 有权
    制造薄膜晶体管的方法,包括该薄膜晶体管的有机发光显示装置的制造方法以及使用该方法制造的薄膜晶体管和有机发光显示装置

    公开(公告)号:US09153700B2

    公开(公告)日:2015-10-06

    申请号:US14034291

    申请日:2013-09-23

    Abstract: A method of manufacturing a thin-film transistor includes: forming an oxide semiconductor pattern including a first region and a second region on a substrate; forming an insulation film on the substrate to cover the oxide semiconductor pattern; removing the insulation film on the second region through patterning; increasing carrier density of the first region of the oxide semiconductor pattern through an annealing process; forming a gate electrode on the insulation film so that the gate electrode is insulated from the oxide semiconductor pattern and overlaps the second region; and forming a source electrode and a drain electrode to be insulated from the gate electrode and contact the first region.

    Abstract translation: 制造薄膜晶体管的方法包括:在衬底上形成包括第一区域和第二区域的氧化物半导体图案; 在所述基板上形成绝缘膜以覆盖所述氧化物半导体图案; 通过图案去除第二区域上的绝缘膜; 通过退火处理来增加氧化物半导体图案的第一区域的载流子密度; 在所述绝缘膜上形成栅电极,使得所述栅电极与所述氧化物半导体图案绝缘并且与所述第二区域重叠; 以及形成与栅电极绝缘的源电极和漏极,并与第一区接触。

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