公开(公告)号：US07052370B2

公开(公告)日：2006-05-30

申请号：US10437967

申请日：2003-05-15

申请人： Tomoaki Nakasuji ,  Masahiko Hasegawa ,  Yoshinori Hirai

发明人： Tomoaki Nakasuji ,  Masahiko Hasegawa ,  Yoshinori Hirai

IPC分类号： B24B49/00

CPC分类号： G05B19/186 ,  B23Q17/22 ,  B24B5/06 ,  B24B19/14 ,  B24B27/0084 ,  G05B19/184 ,  G05B19/404 ,  G05B2219/41344 ,  G05B2219/49172

摘要： A rotation axis of a work spindle and a rotation axis of a spindle primary-axis portion are rotated relative to each other and feeding of a work-piece to a tool is accordingly adjusted, whereby warpage of the tool in accordance with a change in machining condition is corrected. A revolution volume of the relative rotation is compared and calculated in process based on data entered in advance, a result of measurement by a displacement sensor and information such as a machining position, and controlled in real time until the end of machining. The relative rotation is driven by an actuator such as a piezoelectric element, at a resolution even as fine as in seconds. The data entered in advance can be sequentially updated in accordance with monitoring of a processed product.

公开(公告)号：US06663247B1

公开(公告)日：2003-12-16

申请号：US10110975

申请日：2002-04-18

申请人： Koji Uno ,  Masahiko Hasegawa

发明人： Koji Uno ,  Masahiko Hasegawa

IPC分类号： G02B508

CPC分类号： G02B7/1825 ,  Y10T74/18752

摘要： A reflecting mirror unit according to the present invention comprises a mirror, mirror holding arrangement for holding the periphery of the mirror, in which an outer circumferential portion perpendicular to a reflection surface of the mirror is shaped like a circular arc in cross section, a first carrier that is contact with a part of the outer circumferential portion on the mirror reflection surface side for the mirror holding arrangement at a part of its inner conical surface, a second carrier that is opposed via the mirror holding arrangement to the first carrier, and is contact with a part of the outer circumferential portion on the mirror back face side for the mirror holding arrangement at a part of the inner conical surface, and pressure securing arrangement for pressing the first carrier and the second carrier against the mirror holding arrangement. The mirror can be securely retained in a fixed state after adjusting the angle of the mirror, and the reflecting mirror unit can be reduced in size and weight.

摘要翻译： 根据本发明的反射镜单元包括反射镜，用于保持反射镜周边的反射镜保持装置，其中垂直于反射镜的反射表面的外周部分的横截面形状为圆弧形，第一 载体，其与其内圆锥形表面的一部分处的反射镜保持装置的镜反射面侧的外周部分的一部分接触;第二载体，其经由反射镜保持装置相对于第一载体，并且是 与反射镜保持装置的反射镜保持装置的外侧圆周部分的一部分在内圆锥形表面的一部分处接触，以及用于将第一载体和第二载体压靠在镜保持装置上的压力固定装置。 在调整反射镜的角度之后，可以将镜子牢固地保持在固定状态，并且可以减小反射镜单元的尺寸和重量。

公开(公告)号：US5614110A

公开(公告)日：1997-03-25

申请号：US495513

申请日：1995-07-28

申请人： Toshiya Shintani ,  Masahiko Hasegawa

发明人： Toshiya Shintani ,  Masahiko Hasegawa

IPC分类号： B23K10/00 ,  H05H1/34

CPC分类号： B23K10/00 ,  B23K10/006

摘要： The present invention comprises a plasma cutting method and a cutting apparatus in which switching can be effected between suitable flow rates of a protective gas at the time of piercing and at the time of cutting, and in which suitable compositions of the protective gas can be set with respect to the time of piercing and the time of cutting, so that it is possible to protect a nozzle favorably from dross and the like, to provide a cut surface high quality and to reduce the operating cost of the protective gas. To achieve this, there are provided a piercing completion detection unit (27, 40) which detects an electric current between an electrode (1) and a workpiece (31) at the time of piercing, and which outputs a signal at the time of the completion of the piercing, and a flow regulator (15) which is provided in a protective gas circuit and which switches, in response to the piercing completion signal, the flow rate of the protective gas from a flow rate at the time of piercing to a flow rate at the time of cutting. Further, on-off valves (51, 53) can be provided in the protective gas circuit to effect switching between the composition of the protective gas at the time of piercing and the composition at the time of cutting.

摘要翻译： PCT No.PCT / JP94 / 00091 Sec。 371日期：1995年7月28日 102（e）日期1995年7月28日PCT 1994年1月25日PCT PCT。 公开号WO94 / 16857 日期1994年8月4日本发明包括等离子切割方法和切割装置，其中可以在穿孔时和切割时的保护气体的合适流速之间进行切换，并且其中合适的组成 可以相对于穿孔时间和切割时间来设定保护气体，从而可以有效地保护喷嘴免于浮渣等，从而提供切割表面的高品质并降低保护性的操作成本 加油站。 为了实现这一点，提供了一种在穿孔时检测电极（1）和工件（31）之间的电流的穿孔完成检测单元（27,40），并且在穿孔完成检测单元 完成穿孔，以及流量调节器（15），其设置在保护气体回路中，并且响应于穿刺完成信号将保护气体的流量从穿刺时的流速切换到 切割时的流量。 此外，可以在保护气体回路中设置开闭阀（51,53），以实现穿孔时的保护气体的组成与切断时的组成之间的切换。

公开(公告)号：US5326955A

公开(公告)日：1994-07-05

申请号：US941087

申请日：1992-10-19

申请人： Yozo Nishi ,  Eiichi Nozaki ,  Masahiko Hasegawa ,  Iwao Kurkawa ,  Atsushi Wakui

发明人： Yozo Nishi ,  Eiichi Nozaki ,  Masahiko Hasegawa ,  Iwao Kurkawa ,  Atsushi Wakui

IPC分类号： B23K9/12 ,  B23K10/00 ,  B23K10/02 ,  H05H1/34 ,  H05H1/36 ,  B23K9/073

CPC分类号： H05H1/36 ,  B23K10/006 ,  B23K10/02 ,  B23K9/126 ,  H05H2001/3494

摘要： The present invention discloses a standoff control method and an apparatus for a plasma cutting machine capable of quickly correcting a deviation of the standoff with respect to a set value, keeping constant the standoff even if the cutting speed changes, preventing deterioration of the working efficiency even if a double-arc is generated, and properly detecting the use limit of the electrode. Standoff correction computing device (28) includes a reference voltage computation setter (36) for outputting a reference voltage between a workpiece to be cut and an electrode or a nozzle with respect to a predetermined standoff, an error computing device (37) for calculating the deviation of said detected voltage with respect to the reference voltage, and a correction quantity computing device (38) for outputting a vertical repositioning speed signal for the torch in accordance with the degree of the deviation. An electrode consumption/standoff detector (34) can be provided which outputs, to the error computing device (37) a standoff signal which is obtained by correcting for the degree of rise of the voltage which has taken place due to the consumption of the electrode (12).

摘要翻译： PCT No.PCT / JP91 / 00514 Sec。 371日期：1992年10月19日 102（e）日期1992年10月19日PCT 1991年4月17日PCT PCT。 公开号WO91 / 16170 日本1991年10月31日。本发明公开了一种等离子切割机的间隔控制方法和装置，其能够相对于设定值快速校正间隙的偏差，即使切割速度变化也保持间隔， 即使产生双电弧也能防止工作效率的劣化，并适当地检测电极的使用极限。 间隔校正计算装置（28）包括：参考电压计算设定器（36），用于相对于预定的间隔输出待切割的工件与电极或喷嘴之间的参考电压;误差计算装置（37），用于计算 所述检测电压相对于参考电压的偏差;以及校正量计算装置（38），用于根据偏差度输出用于割炬的垂直重新定位速度信号。 可以提供电极消耗/间隔检测器（34），其向误差计算装置（37）输出通过校正由于电极的消耗而发生的电压的上升程度而获得的间隔信号 （12）。