公开(公告)号：US09201312B2

公开(公告)日：2015-12-01

申请号：US14302708

申请日：2014-06-12

Applicant: KLA-Tencor Corporation

Inventor： Stefan Eyring ,  Oliver Ache ,  Frank Laske

IPC: G06K9/00 ,  G03F7/20

CPC classification number: G06T7/001 ,  G03F1/44 ,  G03F1/84 ,  G03F7/70633 ,  G06K9/52 ,  G06T7/248 ,  G06T7/337 ,  G06T7/62 ,  G06T7/74 ,  G06T2207/30148

Abstract: A method is disclosed for correcting errors introduced by optical distortions or aberrations in the measured values of coordinates of targets of an array of targets, like for example structures on a wafer or a photolithography mask. The array of targets is placed into a field of view of an imaging system via which the coordinates are to be measured. The array of targets is placed at different relative positions with respect to the field of view, and for each relative position the coordinates of the targets relative to the array of targets are determined by measurements. From the results of these measurements an alignment function, giving a correction for optical errors as a function of the position in the field of view, is derived. The measured coordinates are corrected by the alignment function. The corrected coordinates can be used to identify registration errors of a mask writer.

Abstract translation: 公开了一种用于校正由目标阵列的目标坐标的测量值中的光学失真或像差引入的误差的方法，例如晶片或光刻掩模上的结构。 目标阵列被放置在成像系统的视场中，坐标将被测量。 目标阵列相对于视场位于不同的相对位置，并且对于每个相对位置，靶相对于目标阵列的坐标由测量确定。 从这些测量结果可得出对准函数，作为视场中的位置的函数的光学误差的校正。 测量的坐标通过对准功能进行校正。 校正的坐标可用于识别掩码写入器的注册错误。