A DETECTING SUBSTRATE, A MANUFACTURING METHOD THEREOF AND A PHOTOELECTRIC DETECTION DEVICE

    公开(公告)号:US20200259034A1

    公开(公告)日:2020-08-13

    申请号:US16611377

    申请日:2019-03-22

    Inventor: Rui Huang Huili WU

    Abstract: The present disclosure provides a detecting substrate, a manufacturing method thereof and a photoelectric detection device including the detecting substrate. The detecting substrate including: a substrate; and a photoelectric conversion element formed on the substrate, wherein the photoelectric conversion element is a PIN device comprising a first doped semiconductor layer, an intrinsic semiconductor layer and a second doped semiconductor layer, wherein a side wall of the intrinsic semiconductor layer is covered by an etching protective layer.

Patent Agency Ranking